Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9350629 | 0.81 | — | — | |
| SCHEMBL1862077 | 0.79 | DNM1 (0.33) | DNM1 | |
| SCHEMBL1491905 | 0.79 | THRB (0.38) | — | |
| SCHEMBL703926 | 0.79 | — | — | |
| SCHEMBL28372669 | 0.79 | — | — | |
| SCHEMBL705230 | 0.79 | TDP1 (0.32) | — | |
| SCHEMBL705778 | 0.75 | — | — | |
| SCHEMBL4090956 | 0.75 | — | — | |
| SCHEMBL1005297 | 0.75 | — | — | |
| SCHEMBL707267 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0456469-B1 | Photosensitive heat-resistant polymer having hydroxyphenyl group | CHISSO CORP (JP) | 1996-08-21 | — | — | EP | disclosed |
| US-5449588-A | Shrinkage inhibition | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5342739-A | Coating a substrate with a polyamic acid modified by an amino- or hydroxy-substituted phenol; shelf life | CHISSO CORPORATION (JP) | 1994-08-30 | — | — | US | disclosed |
| US-5320935-A | Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups | CHISSO CORPORATION (JP) | 1994-06-14 | — | — | US | disclosed |
| US-5298359-A | Combined with initiator,, an azide, an unsaturated compound | CHISSO CORPORATION (JP) | 1994-03-29 | — | — | US | disclosed |
| EP-0526650-A1 | PHOTOSENSITIVE POLYMER COMPOSITION AND PATTERN FORMATION | CHISSO CORPORATION (JP) | 1993-02-10 | — | — | EP | disclosed |
| EP-0456469-A2 | Photosensitive heat-resistant polymer having hydroxyphenyl group | Chisso Corporation (JP) | 1991-11-13 | — | — | EP | disclosed |
| US-3948835-A | POLYAMIDE, POLYAMIDE-ACID OR POLYAMIDE-AMIDE-ACIDS | CIBA-GEIGY CORPORATION (US) | 1976-04-06 | — | — | US | disclosed |