SCHEMBL9003539

SCHEMBL9003539

Clc1ccc([S+](Cc2ccccc2)c2ccc(Cl)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 1/20 0.44
TSHR P16473 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.41
MAPT P10636 2/20 0.41
CYP1A2 P05177 1/20 0.41
ALDH1A1 P00352 2/20 0.39
DRD4 P21917 1/20 0.38
GRIN2B Q13224 1/20 0.38
TRPA1 O75762 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
G6PC1 P35575 1/20 0.37
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
CYP3A4 P08684 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
HIF1A Q16665 1/20 0.36
HSD17B10 Q99714 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
BCHE P06276 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2323147 0.91 SIGMAR1 (0.44) SIGMAR1TSHRL3MBTL1MAPTCYP1A2
SCHEMBL1127586 0.84 TSHR (0.46) TSHRALDH1A1TRPA1TDP1HPGD
Hydrochloric Acid SCHEMBL1042662 0.81 TSHR (0.43) TSHRALDH1A1TRPA1TDP1HPGD
SCHEMBL28468805 0.79 SIGMAR1 (0.41) SIGMAR1TSHRL3MBTL1MAPTCYP1A2
SCHEMBL5693416 0.76 TSHR (0.39) TSHRL3MBTL1ALDH1A1TRPA1TDP1
SCHEMBL2323723 0.74 RAB9A (0.44) TSHRMAPTALDH1A1MEN1KMT2A
SCHEMBL11178394 0.72 TSHR (0.36) TSHRALDH1A1TRPA1HPGDALOX15
SCHEMBL13146728 0.71 CYP1A2 (0.43) SIGMAR1TSHRL3MBTL1MAPTCYP1A2
SCHEMBL30958874 0.71 SIGMAR1 (0.41) SIGMAR1TSHRL3MBTL1MAPTCYP1A2
SCHEMBL9357288 0.71 SIGMAR1 (0.46) SIGMAR1TSHRL3MBTL1MAPTCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed