Perchlorate

Perchlorate

SCHEMBL9003671

O=C(C[S+](c1ccccc1)c1ccccc1)c1ccccc1.[O-][Cl+3]([O-])([O-])[O-]

nearest known ligand 0.47

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.47
MAPT P10636 3/20 0.47
CYP3A4 P08684 3/20 0.47
KMT2A Q03164 3/20 0.47
MAPK1 P28482 2/20 0.47
MEN1 O00255 2/20 0.47
HPGD P15428 2/20 0.47
CES1 P23141 2/20 0.47
KDM4E B2RXH2 1/20 0.47
ALOX15 P16050 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
PTPN1 P18031 2/20 0.46
ERCC5 P28715 2/20 0.46
FEN1 P39748 2/20 0.46
ALDH1A1 P00352 4/20 0.44
GSK3B P49841 3/20 0.44
HIF1A Q16665 2/20 0.44
TRPA1 O75762 1/20 0.44
L3MBTL1 Q9Y468 3/20 0.42
LMNA P02545 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1095578 0.92 TDP1 (0.54) TDP1MAPTCYP3A4KMT2AMAPK1
Perchlorate SCHEMBL9003749 0.89 HSD11B1 (0.45) MAPTCYP3A4KMT2AMAPK1MEN1
Perchlorate SCHEMBL8752338 0.89 KMT2A (0.53) TDP1MAPTKMT2AMAPK1MEN1
SCHEMBL8855000 0.85 MAPT (0.47) TDP1MAPTCYP3A4KMT2AMAPK1
Trifluoromethanesulfonic Acid SCHEMBL9626694 0.80 CES1 (0.39) TDP1MAPTCYP3A4KMT2AMAPK1
SCHEMBL9003649 0.80 KMT2A (0.59) TDP1MAPTKMT2AMAPK1MEN1
SCHEMBL2404286 0.80 MAPT (0.56) MAPTKMT2AMAPK1MEN1HPGD
SCHEMBL9003443 0.80 MAPT (0.51) TDP1MAPTCYP3A4KMT2AMAPK1
SCHEMBL1127783 0.78 CES1 (0.56) TDP1MAPTKMT2AMAPK1MEN1
SCHEMBL4110305 0.77 KMT2A (0.50) TDP1MAPTCYP3A4KMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed