Lithium Ion

Lithium Ion

SCHEMBL9003805

C=CC[B-](c1ccc(Br)cc1)(c1ccc(Br)cc1)c1ccc(Br)cc1.[Li+]

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
PYCR1 P32322 1/20 0.36
ALDH1A1 P00352 1/20 0.36
MAPK1 P28482 1/20 0.36
CYP2A6 P11509 1/20 0.35
MMP9 P14780 1/20 0.33
TGM2 P21980 3/20 0.32
F13A1 P00488 1/20 0.31
LMNA P02545 1/20 0.31
TGM1 P22735 1/20 0.31
TGM3 Q08188 1/20 0.31
LSS P48449 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3446689 0.75 ALDH1A1 (0.36) ALDH1A1MMP9LMNA
SCHEMBL8979469 0.63
SCHEMBL20060546 0.63 KMT2A (0.33) ALDH1A1
SCHEMBL9555434 0.62 ALDH1A1 (0.47) PYCR1ALDH1A1MAPK1CYP2A6MMP9
SCHEMBL648420 0.62 ALDH1A1 (0.52) PYCR1ALDH1A1MAPK1CYP2A6TGM2
SCHEMBL1451609 0.61 CYP2A6 (0.57) ALDH1A1MAPK1CYP2A6MMP9
SCHEMBL8757360 0.61 CYP1A2 (0.39) ALDH1A1MAPK1CYP2A6LMNA
Ethylene SCHEMBL28289342 0.59 CYP2A6 (0.80) ALDH1A1MAPK1CYP2A6
SCHEMBL2170246 0.59 CYP2C19 (0.41) PYCR1CYP2A6MMP9TGM2F13A1
SCHEMBL410871 0.59 TAAR1 (0.50) PYCR1CYP2A6TGM2LSS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed