⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27937059 | 0.66 | — | — | |
| SCHEMBL28735911 | 0.59 | TSHR (0.31) | — | |
| SCHEMBL28876071 | 0.56 | — | — | |
| SCHEMBL9118341 | 0.49 | LMNA (0.33) | — | |
| SCHEMBL1502113 | 0.47 | S100A4 (0.48) | — | |
| SCHEMBL20985115 | 0.47 | S100A4 (0.48) | — | |
| Nitric Acid SCHEMBL318000 | 0.46 | — | — | |
| Nitric Acid SCHEMBL30173156 | 0.46 | — | — | |
| Hydrogen Peroxide SCHEMBL28709584 | 0.46 | MEN1 (0.60) | — | |
| Nitric Acid SCHEMBL29624826 | 0.46 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113637154-B | Nonionic polyether type high-molecular surfactant and preparation method and application thereof | 常熟耐素生物材料科技有限公司 | 2025-03-11 | — | — | CN | disclosed |
| US-11866584-B2 | High-refractive-index composition, high-refractive-index film, and method for manufacturing high-refractive-index film | LG CHEM, LTD. (KR) | 2024-01-09 | — | — | US | disclosed |
| CN-111801388-B | High refractive composition, high refractive film, and method for manufacturing high refractive film | 株式会社LG化学 | 2022-04-01 | — | — | CN | disclosed |
| CN-113637153-B | Multi-block polyether type high-molecular surfactant and preparation method and application thereof | 常熟耐素生物材料科技有限公司 | 2022-03-22 | — | — | CN | disclosed |
| CN-109715728-B | Adducts and uses thereof | 亨斯迈先进材料美国有限责任公司 | 2021-11-30 | — | — | CN | disclosed |
| CN-113637153-A | Multi-block polyether type high-molecular surfactant and preparation method and application thereof | 常熟耐素生物材料科技有限公司 | 2021-11-12 | — | — | CN | disclosed |
| CN-113637155-A | Anionic polyether type high-molecular surfactant and preparation method thereof | 常熟耐素生物材料科技有限公司 | 2021-11-12 | — | — | CN | disclosed |
| CN-113637154-A | Nonionic polyether type high-molecular surfactant and preparation method and application thereof | 常熟耐素生物材料科技有限公司 | 2021-11-12 | — | — | CN | disclosed |
| US-20210095128-A1 | HIGH-REFRACTIVE-INDEX COMPOSITION, HIGH-REFRACTIVE-INDEX FILM, AND METHOD FOR MANUFACTURING HIGH-REFRACTIVE-INDEX FILM | LG CHEM, LTD. (KR) | 2021-04-01 | — | — | US | disclosed |
| CN-111801388-A | High refractive composition, high refractive film, and method for manufacturing high refractive film | 株式会社LG化学 | 2020-10-20 | — | — | CN | disclosed |
| EP-2563835-A1 | EPOXY POLYCYCLOPENTADIENE COMPOUNDS | Dow Global Technologies LLC (US) | 2013-03-06 | — | — | EP | disclosed |
| US-20130046067-A1 | POLYCYCLOPENTADIENE COMPOUNDS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-02-21 | — | — | US | disclosed |
| WO-2012050688-A2 | EPOXY RESIN ADDUCTS AND THERMOSETS THEREOF | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-04-19 | — | — | WO | disclosed |
| WO-2012047420-A2 | THERMOSETTABLE COMPOSITIONS AND THERMOSETS THEREFROM | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-04-12 | — | — | WO | disclosed |
| WO-2012044443-A1 | EPOXY RESIN COMPOSITIONS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-04-05 | — | — | WO | disclosed |
| WO-2011136843-A1 | EPOXY POLYCYCLOPENTADIENE COMPOUNDS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2011-11-03 | — | — | WO | disclosed |
| CN-102037049-A | Adducts of epoxy resins and process for preparing the same | DOW GLOBAL TECHNOLOGIES INC | 2011-04-27 | — | — | CN | disclosed |
| CN-102037047-A | Adducts of epoxy resins derived from alkanolamides and a process for preparing the same | DOW GLOBAL TECHNOLOGIES INC | 2011-04-27 | — | — | CN | disclosed |
| US-20110046321-A1 | ADDUCTS OF EPOXY RESINS DERIVED FROM ALKANOLAMIDES AND A PROCESS FOR PREPARING THE SAME | DOW GLOBAL TECHNOLOGIES LLC | 2011-02-24 | — | — | US | disclosed |
| US-20110040046-A1 | ADDUCTS OF EPOXY RESINS AND PROCESS FOR PREPARING THE SAME | BLUE CUBE IP LLC | 2011-02-17 | — | — | US | disclosed |