SCHEMBL9006418

SCHEMBL9006418

O=C(O)Cc1ccc(/C=C2/CCC/C(=C\c3ccc(OC(F)=C(F)F)cc3)C2=O)cc1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.48
HPGD P15428 2/20 0.48
MAPT P10636 1/20 0.48
HTT P42858 1/20 0.48
HSD11B1 P28845 2/20 0.45
F3 P13726 2/20 0.45
CYP2C9 P11712 1/20 0.45
RXRA P19793 1/20 0.44
RXRB P28702 1/20 0.44
RXRG P48443 1/20 0.44
F2 P00734 5/20 0.44
MGAM O43451 3/20 0.44
GAA P10253 3/20 0.44
SI P14410 3/20 0.44
MGAM2 Q2M2H8 3/20 0.44
EGFR P00533 3/20 0.43
F10 P00742 4/20 0.40
PLAU P00749 1/20 0.40
HPN P05981 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006423 1.00 CYP1A2 (0.48) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006660 0.88 CYP1A2 (0.60) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006653 0.88 CYP1A2 (0.60) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006515 0.85 MAPT (0.42) CYP1A2HPGDMAPTHTTRXRA
SCHEMBL9006508 0.85 MAPT (0.42) CYP1A2HPGDMAPTHTTRXRA
SCHEMBL9006727 0.83 CYP2C9 (0.68) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006733 0.83 CYP2C9 (0.68) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006531 0.82 CYP1A2 (0.54) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006539 0.82 CYP1A2 (0.54) CYP1A2HPGDMAPTHTTHSD11B1
SCHEMBL9006620 0.80 KMT2A (0.44) HPGDMAPTHTTRXRARXRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed