SCHEMBL9006469

SCHEMBL9006469

O=c1ccc2cccc(OC(F)=C(F)F)c2o1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2A6 P11509 1/20 0.59
▸ ALOX15 P16050 4/20 0.44
▸ MCL1 Q07820 4/20 0.43
▸ XPO1 O14980 1/20 0.41
▸ TDP1 Q9NUW8 3/20 0.41
▸ KDM4E B2RXH2 2/20 0.41
▸ ALDH1A1 P00352 2/20 0.41
▸ MAPT P10636 2/20 0.41
▸ HPGD P15428 2/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ LMNA P02545 2/20 0.41
▸ PRKD3 O94806 1/20 0.41
▸ EGFR P00533 1/20 0.41
▸ PRKCG P05129 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ PRKCB P05771 1/20 0.41
▸ POLB P06746 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ CYP2D6 P10635 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006707 0.85 CYP2A6 (0.50) CYP2A6ALOX15TDP1ALDH1A1MAPT
SCHEMBL16283609 0.79 CYP2A6 (0.66) CYP2A6ALOX15MCL1XPO1TDP1
SCHEMBL9006636 0.78 CA9 (0.41) ALOX15MCL1TDP1KDM4EALDH1A1
SCHEMBL9006779 0.75 CYP2A6 (0.59) CYP2A6ALOX15MCL1TDP1KDM4E
SCHEMBL2635928 0.75 CYP2A6 (1.00) CYP2A6ALOX15MCL1TDP1KDM4E
SCHEMBL9006576 0.74 MET (0.41) ALOX15MCL1TDP1KDM4EALDH1A1
SCHEMBL9006827 0.73 MCL1 (0.35) MCL1KDM4EALDH1A1MAPTHPGD
SCHEMBL15842328 0.72 CYP2A6 (0.70) CYP2A6ALOX15MCL1XPO1TDP1
SCHEMBL16283614 0.71 CYP2A6 (0.68) CYP2A6ALOX15MCL1XPO1TDP1
SCHEMBL11033454 0.71 CYP2A6 (0.68) CYP2A6ALOX15CYP1A2CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO disclosed
Send feedback