SCHEMBL9006779

SCHEMBL9006779

O=c1ccc2c(OC(F)=C(F)F)cccc2o1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2A6 P11509 5/20 0.59
▸ CYP3A4 P08684 3/20 0.51
▸ KCNA3 P22001 1/20 0.49
▸ ALOX15 P16050 2/20 0.44
▸ ALDH1A1 P00352 2/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ TP53 P04637 1/20 0.39
▸ TSHR P16473 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ GLA P06280 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ CA12 O43570 5/20 0.37
▸ CA9 Q16790 5/20 0.37
▸ CA1 P00915 3/20 0.37
▸ CA2 P00918 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ CA3 P07451 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006604 0.85 CYP2A6 (0.47) CYP2A6CYP3A4KCNA3ALOX15ALDH1A1
SCHEMBL16283607 0.79 CYP2A6 (0.66) CYP2A6CYP3A4KCNA3ALOX15ALDH1A1
SCHEMBL9006636 0.78 CA9 (0.41) CYP3A4ALOX15ALDH1A1MEN1TSHR
SCHEMBL14330333 0.76 CYP2A6 (0.60) CYP2A6CYP3A4KCNA3ALOX15ALDH1A1
SCHEMBL9006469 0.75 CYP2A6 (0.59) CYP2A6CYP3A4ALOX15ALDH1A1MEN1
SCHEMBL29396463 0.75 CYP2A6 (1.00) CYP2A6CYP3A4KCNA3ALOX15ALDH1A1
SCHEMBL1859616 0.75 CYP2A6 (1.00) CYP2A6CYP3A4KCNA3ALOX15ALDH1A1
SCHEMBL9006756 0.74 MCL1 (0.40) CYP3A4ALOX15ALDH1A1MEN1TP53
SCHEMBL14999384 0.73 GAA (0.41) ALOX15ALDH1A1MEN1KMT2AHSD17B10
SCHEMBL9006409 0.73 CA9 (0.37) CYP3A4ALDH1A1KMT2AKDM4EGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO disclosed
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