SCHEMBL9006533

SCHEMBL9006533

C#Cc1ccc(C(C)(c2ccc(OC(F)=C(F)F)cc2)c2ccc(OC(F)=C(F)F)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.38
MAPT P10636 2/20 0.31
NPC1 O15118 1/20 0.31
HTT P42858 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
MAOB P27338 1/20 0.31
AOC3 Q16853 1/20 0.31
TDP1 Q9NUW8 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1505720 0.87 MAPT (0.38) MAPTNPC1HTTRAB9ASMN1; SMN2
SCHEMBL9006568 0.85 ACACB (0.31) MAOBAOC3
SCHEMBL9006437 0.83 NPC1 (0.30) MAPTNPC1HTTRAB9ASMN1; SMN2
SCHEMBL9006513 0.83 NPC1 (0.30) MAPTNPC1HTTRAB9ASMN1; SMN2
SCHEMBL12834526 0.80 HSD11B1 (0.43) MAPTNPC1RAB9AAOC3TDP1
SCHEMBL12834528 0.80 ESR1 (0.50) ESR1ESR2
SCHEMBL8639066 0.80 ESR1 (0.50) MAPTNPC1HTTRAB9ASMN1; SMN2
SCHEMBL12200936 0.76 MAPT (0.49) MAPTNPC1HTTRAB9ASMN1; SMN2
SCHEMBL5052389 0.76 ESR1 (0.43) MAPTNPC1HTTRAB9ASMN1; SMN2
SCHEMBL13577644 0.75 ESR2 (0.44) MAPTESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed