SCHEMBL9006568

SCHEMBL9006568

C#CC#Cc1ccc(C(C)(c2ccc(OC(F)=C(F)F)cc2)c2ccc(OC(F)=C(F)F)cc2)cc1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ACACB O00763 2/20 0.31
MAOB P27338 1/20 0.31
AOC3 Q16853 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006513 0.95 NPC1 (0.30) ACACB
SCHEMBL9006437 0.95 NPC1 (0.30) ACACB
SCHEMBL9006533 0.85 PTPN1 (0.38) MAOBAOC3
SCHEMBL1505720 0.82 MAPT (0.38) MAOBAOC3
SCHEMBL12834528 0.76 ESR1 (0.50)
SCHEMBL8639066 0.76 ESR1 (0.50)
SCHEMBL12834526 0.76 HSD11B1 (0.43) AOC3
SCHEMBL12200936 0.71 MAPT (0.49) MAOBAOC3
SCHEMBL5052389 0.71 ESR1 (0.43) MAOBAOC3
SCHEMBL13577644 0.71 ESR2 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed