SCHEMBL9006633

SCHEMBL9006633

CC(c1ccc(/C=C/C(=O)/C=C/c2ccccc2)cc1)(c1ccc(OC(F)=C(F)F)cc1)c1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.49
ALDH1A1 P00352 5/20 0.47
LMNA P02545 4/20 0.47
MAPT P10636 4/20 0.47
F3 P13726 2/20 0.47
PLIN1 O60240 1/20 0.47
CYP2D6 P10635 1/20 0.47
CYP2C9 P11712 1/20 0.47
RECQL P46063 1/20 0.47
PLIN5 Q00G26 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
ABHD5 Q8WTS1 1/20 0.47
KMT2A Q03164 4/20 0.47
MEN1 O00255 2/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
PPARA Q07869 1/20 0.41
GSK3B P49841 2/20 0.41
BACE1 P56817 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006637 1.00 CYP1A2 (0.49) CYP1A2ALDH1A1LMNAMAPTF3
SCHEMBL9006540 0.90 F3 (0.60) CYP1A2MAPTF3KMT2AMEN1
SCHEMBL9006732 0.90 CYP1A2 (0.60) CYP1A2F3PPARACYP1B1MAOB
SCHEMBL9006799 0.90 HSD11B1 (0.53) CYP1A2LMNAF3KMT2AMEN1
SCHEMBL9006544 0.90 F3 (0.60) CYP1A2MAPTF3KMT2AMEN1
SCHEMBL9006794 0.90 HSD11B1 (0.53) CYP1A2LMNAF3KMT2AMEN1
SCHEMBL9006726 0.90 CYP1A2 (0.60) CYP1A2F3PPARACYP1B1MAOB
SCHEMBL9006612 0.89 F3 (0.59) CYP1A2ALDH1A1LMNAMAPTF3
SCHEMBL9006616 0.89 F3 (0.59) CYP1A2ALDH1A1LMNAMAPTF3
SCHEMBL9006786 0.89 CYP1A2 (0.51) CYP1A2ALDH1A1LMNAMAPTF3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed