SCHEMBL9006799

SCHEMBL9006799

CC(c1ccc(C=CC(=O)C=Cc2ccc(F)cc2)cc1)(c1ccc(OC(F)=C(F)F)cc1)c1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.53
CYP1A2 P05177 2/20 0.49
F3 P13726 1/20 0.46
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
CYP1A1 P04798 2/20 0.42
CYP1B1 Q16678 2/20 0.42
GSK3B P49841 1/20 0.42
BACE1 P56817 1/20 0.42
MAOB P27338 3/20 0.41
LMNA P02545 1/20 0.41
TP53 P04637 1/20 0.41
TUBB4A P04350 1/20 0.40
TUBB P07437 1/20 0.40
TUBA3C P0DPH7 1/20 0.40
TUBA1B P68363 1/20 0.40
TUBA4A P68366 1/20 0.40
TUBB4B P68371 1/20 0.40
TUBB3 Q13509 1/20 0.40
TUBB2A Q13885 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006794 1.00 HSD11B1 (0.53) HSD11B1CYP1A2F3MEN1KMT2A
SCHEMBL9006544 0.90 F3 (0.60) CYP1A2F3MEN1KMT2ACYP1A1
SCHEMBL9006637 0.90 CYP1A2 (0.49) CYP1A2F3MEN1KMT2ACYP1A1
SCHEMBL9006726 0.90 CYP1A2 (0.60) CYP1A2F3CYP1A1CYP1B1MAOB
SCHEMBL9006633 0.90 CYP1A2 (0.49) CYP1A2F3MEN1KMT2ACYP1A1
SCHEMBL9006732 0.90 CYP1A2 (0.60) CYP1A2F3CYP1A1CYP1B1MAOB
SCHEMBL9006540 0.90 F3 (0.60) CYP1A2F3MEN1KMT2ACYP1A1
SCHEMBL9006693 0.89 HSD11B1 (0.66) HSD11B1CYP1A2F3MEN1KMT2A
SCHEMBL9006689 0.89 HSD11B1 (0.66) HSD11B1CYP1A2F3MEN1KMT2A
SCHEMBL9006782 0.89 CYP1A2 (0.51) CYP1A2F3MEN1KMT2ACYP1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed