SCHEMBL9006646

SCHEMBL9006646

C=C(C)C(=O)Oc1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.56
KMT2A Q03164 6/20 0.51
ATM Q13315 1/20 0.51
LMNA P02545 3/20 0.38
MAPT P10636 5/20 0.38
POLB P06746 2/20 0.36
HTT P42858 2/20 0.36
APEX1 P27695 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ALDH1A1 P00352 3/20 0.35
RAB9A P51151 1/20 0.35
MEN1 O00255 3/20 0.35
PKM P14618 1/20 0.35
HSD17B10 Q99714 2/20 0.33
HSP90AA1 P07900 1/20 0.33
GAA P10253 1/20 0.33
KDM4E B2RXH2 1/20 0.32
TTR P02766 1/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006764 0.89 ELANE (0.47) ELANEKMT2AATMLMNAMAPT
SCHEMBL56436 0.86 ELANE (0.69) ELANEKMT2AATMLMNAMAPT
SCHEMBL6903315 0.81 ELANE (0.59) ELANEKMT2AATMLMNAMAPT
SCHEMBL811469 0.81 ELANE (0.59) ELANEKMT2AATMLMNAMAPT
SCHEMBL14173256 0.80 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL14173258 0.80 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL16334971 0.80 ELANE (0.68) ELANEKMT2AATMLMNAMAPT
SCHEMBL803168 0.80 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL17433304 0.80 ELANE (0.62) ELANEKMT2AATMLMNAMAPT
SCHEMBL9167356 0.80 LMNA (0.59) ELANEKMT2ALMNAMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
EP-3613810-A1 ARTICLES AND COMPOSITIONS COMPRISING HOST POLYMERS AND CHROMOPHORES AND METHODS OF PRODUCING THE SAME General Dynamics Mission Systems, Inc. (US) 2020-02-26 EP disclosed
US-20200048428-A1 ARTICLES AND COMPOSITIONS COMPRISING HOST POLYMERS AND CHROMOPHORES AND METHODS OF PRODUCING THE SAME GENERAL DYNAMICS MISSION SYSTEMS, INC. 2020-02-13 US disclosed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed