SCHEMBL9008729

SCHEMBL9008729

CN1COCN(C)C1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24333517 0.88 KMT2A (0.31)
SCHEMBL9976298 0.73
SCHEMBL186442 0.71
SCHEMBL11539225 0.70 MGLL (0.40)
SCHEMBL2398125 0.69 BRD4 (0.43)
SCHEMBL12252009 0.69
SCHEMBL3043 0.69
SCHEMBL3499583 0.69
SCHEMBL3233528 0.67
SCHEMBL14086722 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025242516-A1 BRANCHED DIENE RUBBER ARLANXEO DEUTSCHLAND GMBH (DE) 2025-11-27 WO disclosed
EP-4476284-A1 MODIFIED DIENE RUBBERS ARLANXEO Deutschland GmbH (DE) 2024-12-18 EP disclosed
EP-4444763-A1 DIENE RUBBERS PREPARED WITH UNSATURATED SILOXANE-BASED COUPLING AGENTS ARLANXEO Deutschland GmbH (DE) 2024-10-16 EP disclosed
EP-4444762-A1 FUNCTIONALIZED DIENE RUBBERS PREPARED WITH UNSATURATED SILOXANE-BASED COUPLING AGENTS ARLANXEO Deutschland GmbH (DE) 2024-10-16 EP disclosed
CN-118574884-A Modified diene rubber 阿朗新科德国有限责任公司 2024-08-30 CN disclosed
CN-118215687-A Functionalized diene rubbers prepared with unsaturated siloxane-based coupling agents 阿朗新科德国有限责任公司 2024-06-18 CN disclosed
CN-118176219-A Diene rubber prepared with unsaturated siloxane-based coupling agents 阿朗新科德国有限责任公司 2024-06-11 CN disclosed
CN-114026132-B Carboxyl terminated diene rubber 阿朗新科德国有限责任公司 2023-12-12 CN disclosed
US-20230384675-A1 UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-30 US disclosed
US-20230384675-A1 UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-30 US disclosed
US-20140273521-A1 PHOTORESIST SYSTEM AND METHOD TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2014-09-18 US disclosed
US-20140273521-A1 PHOTORESIST SYSTEM AND METHOD TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2014-09-18 US disclosed
US-7407536-B2 Ink composition TOYO INK MFG. CO., LTD. (JP) 2008-08-05 US disclosed
US-7407536-B2 Ink composition TOYO INK MFG. CO., LTD. (JP) 2008-08-05 US disclosed
US-20070119335-A1 For printing on non-absorbable printing media, containing as a solvent a a hydrofuran-3-one, hydropyranone, oxazolinone, morpholin-3-one or 1,3-hydrooxazin-4-one; odorless, excellent safety and health properties, resin solubility, printing stability and drying properties and causes no corrosion TOYO INK MFG. CO., LTD. (JP) 2007-05-31 US disclosed
US-20070119335-A1 For printing on non-absorbable printing media, containing as a solvent a a hydrofuran-3-one, hydropyranone, oxazolinone, morpholin-3-one or 1,3-hydrooxazin-4-one; odorless, excellent safety and health properties, resin solubility, printing stability and drying properties and causes no corrosion TOYO INK MFG. CO., LTD. (JP) 2007-05-31 US disclosed
EP-1790700-A1 Organic solvent based ink Composition TOYO INK MFG. CO., LTD. (JP) 2007-05-30 EP disclosed
US-5484903-A Process for the production of polysaccharide carbonates WOLFF WALSRODE AKTIENGESELLSCHAFT (DE) 1996-01-16 US disclosed
US-5413627-A Scrubbing with saturated or unsaturated heterocyclic nitrogen compound, amine, amide, urea, hydrazine, hydrazide, hydrazone functional groups LINDE AKTIENGESELLSCHAFT (DE) 1995-05-09 US disclosed
US-5068321-A CARBONIC ACID ESTERS OF POLYSACCHARIDES AND A PROCESS FOR THEIR PRODUCTION WOLFF WALSRODE AKTIENGESELLSCHAFT (DE) 1991-11-26 US disclosed