Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.73 |
| ▸ | CA1 | P00915 | 2/20 | 0.73 |
| ▸ | CA12 | O43570 | 1/20 | 0.73 |
| ▸ | CA3 | P07451 | 1/20 | 0.73 |
| ▸ | TYR | P14679 | 1/20 | 0.73 |
| ▸ | DRD1 | P21728 | 1/20 | 0.73 |
| ▸ | CA4 | P22748 | 1/20 | 0.73 |
| ▸ | CA6 | P23280 | 1/20 | 0.73 |
| ▸ | CA5A | P35218 | 1/20 | 0.73 |
| ▸ | CA7 | P43166 | 1/20 | 0.73 |
| ▸ | CA9 | Q16790 | 1/20 | 0.73 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.73 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.73 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.64 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 2/20 | 0.55 |
| ▸ | TP53 | P04637 | 1/20 | 0.55 |
| ▸ | HPGD | P15428 | 3/20 | 0.52 |
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL10528690 | 0.91 | CA12 (0.60) | CA2CA1CA12CA3TYR | |
| SCHEMBL15220060 | 0.91 | TSHR (0.67) | CA2CA1CA12CA3TYR | |
| SCHEMBL15220063 | 0.91 | TSHR (0.67) | CA2CA1CA12CA3TYR | |
| SCHEMBL71112 | 0.91 | TSHR (0.67) | CA2CA1CA12CA3TYR | |
| Barium SCHEMBL9452526 | 0.88 | TSHR (0.63) | CA2CA1CA12CA3TYR | |
| Hydrochloric Acid SCHEMBL7138094 | 0.88 | TSHR (0.63) | CA2CA1CA12CA3TYR | |
| SCHEMBL9459884 | 0.88 | TSHR (0.63) | CA2CA1CA12CA3TYR | |
| Terephthalic Acid SCHEMBL6692916 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Paraben SCHEMBL20500516 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Terephthalic Acid SCHEMBL3460105 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0443742-B1 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1997-10-01 | — | — | EP | claimed |
| US-5476754-A | Presensitized; hydrophilic surface on substrate; light sensitive layer containing alkaline water-soluble photocrosslinkable copolycondensed diazo resin | FUJI PHOTO FILM CO., LTD. (JP) | 1995-12-19 | — | — | US | claimed |
| EP-0443742-A2 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | claimed |
| EP-0415422-A2 | Method for forming images | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-06 | — | — | EP | claimed |
| US-11866584-B2 | High-refractive-index composition, high-refractive-index film, and method for manufacturing high-refractive-index film | LG CHEM, LTD. (KR) | 2024-01-09 | — | — | US | disclosed |
| CN-111801388-B | High refractive composition, high refractive film, and method for manufacturing high refractive film | 株式会社LG化学 | 2022-04-01 | — | — | CN | disclosed |
| CN-109715728-B | Adducts and uses thereof | 亨斯迈先进材料美国有限责任公司 | 2021-11-30 | — | — | CN | disclosed |
| US-20210095128-A1 | HIGH-REFRACTIVE-INDEX COMPOSITION, HIGH-REFRACTIVE-INDEX FILM, AND METHOD FOR MANUFACTURING HIGH-REFRACTIVE-INDEX FILM | LG CHEM, LTD. (KR) | 2021-04-01 | — | — | US | disclosed |
| CN-111801388-A | High refractive composition, high refractive film, and method for manufacturing high refractive film | 株式会社LG化学 | 2020-10-20 | — | — | CN | disclosed |
| WO-2020060257-A1 | HIGH-REFRACTIVE-INDEX COMPOSITION, HIGH-REFRACTIVE-INDEX FILM, AND METHOD FOR MANUFACTURING HIGH-REFRACTIVE-INDEX FILM | 주식회사 엘지화학 | 2020-03-26 | — | — | WO | disclosed |
| US-20190211202-A1 | ADDUCTS AND USES THEREOF | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC | 2019-07-11 | — | — | US | disclosed |
| EP-3500627-A1 | ADDUCTS AND USES THEREOF | Huntsman Advanced Materials Americas LLC (US) | 2019-06-26 | — | — | EP | disclosed |
| EP-0492959-A1 | Method for developing presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1992-07-01 | — | — | EP | disclosed |
| EP-0487343-A1 | Process for preparing a lithographic plate | Fuji Photo Film Co., Ltd. (JP) | 1992-05-27 | — | — | EP | disclosed |
| EP-0478918-A2 | Adducts of epoxy resins and active hydrogen containing compounds containing mesogenic moieties | THE DOW CHEMICAL COMPANY (US) | 1992-04-08 | — | — | EP | disclosed |
| EP-0469492-A2 | Polymer modified adducts of epoxy resins and active hydrogen containing compounds containing mesogenic moieties | THE DOW CHEMICAL COMPANY (US) | 1992-02-05 | — | — | EP | disclosed |
| EP-0443742-A2 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |
| EP-0397375-A1 | Photosensitive composition and photosensitive lithographic printing plate | KONICA CORPORATION (JP) | 1990-11-14 | — | — | EP | disclosed |
| EP-0137395-B1 | 4-(HYDROXYPHENYLTHIO)-BENZOATES | CIBA-GEIGY AG (CH) | 1987-11-04 | — | — | EP | disclosed |
| EP-0137395-A2 | 4-(Hydroxyphenylthio)-benzoates | CIBA-GEIGY AG (CH) | 1985-04-17 | — | — | EP | disclosed |