SCHEMBL9011000

SCHEMBL9011000

C=CC(=O)N(COCCC)C(O)CC

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 2/20 0.36
TSHR P16473 2/20 0.33
HPGD P15428 1/20 0.33
HSD17B10 Q99714 1/20 0.32
ZDHHC2 Q9UIJ5 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2120387 0.79 ZDHHC20 (0.48) ZDHHC20TSHRHPGDHSD17B10ZDHHC2
SCHEMBL9015327 0.76 TSHR (0.42) ZDHHC20TSHRHPGDZDHHC2
SCHEMBL4805541 0.75 ZDHHC20 (0.44) ZDHHC20TSHRHPGDHSD17B10ZDHHC2
SCHEMBL17105854 0.74 TSHR (0.37) ZDHHC20TSHRHPGDHSD17B10ZDHHC2
SCHEMBL29236330 0.73 ZDHHC20 (0.54) ZDHHC20TSHRHPGDZDHHC2
SCHEMBL29236326 0.72 TSHR (0.41) ZDHHC20TSHRHPGDZDHHC2
SCHEMBL30879934 0.70 ZDHHC20 (0.35) ZDHHC20TSHRHPGDZDHHC2
SCHEMBL2121555 0.69 ZDHHC20 (0.56) ZDHHC20TSHRHPGDZDHHC2
SCHEMBL588653 0.69 TSHR (0.37) ZDHHC20TSHRZDHHC2
SCHEMBL15144186 0.69 HSD17B10 (0.41) ZDHHC20TSHRHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5043363-A Active energy ray-curing resin composition CANON KABUSHIKI KAISHA (JP) 1991-08-27 US claimed
US-5585221-A GRAFT POLYMER; EXCELLENT BONDING STRENGTH CANON KABUSHIKI KAISHA (JP) 1996-12-17 US disclosed
US-5543266-A A GRAFT COPOLYMERIZED RESIN, AN EPOXY RESIN AND A POLYMERIZATION INITIATOR CAPABLE OF GENERATING LEWIS ACID BY IRRADIATION CANON KABUSHIKI KAISHA (JP) 1996-08-06 US disclosed
US-5476752-A Blend of a linear polymer, unsaturated monomer, epoxy resinand photoinitiator CANON KABUSHIKI KAISHA (JP) 1995-12-19 US disclosed
EP-0209803-B1 LIQUID JET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 1993-09-29 EP disclosed
EP-0209753-B1 ACTIVE ENERGY RAY-CURING RESIN COMPOSITION CANON KABUSHIKI KAISHA (JP) 1993-09-01 EP disclosed
EP-0208300-B1 LIQUID JET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 1993-04-14 EP disclosed
EP-0206086-B1 ACTIVE ENERGY RAY-CURING RESIN COMPOSITION CANON KABUSHIKI KAISHA (JP) 1992-09-09 EP disclosed
US-4688055-A HEAT CROSSLINKABLE SUBSTITUTED (METH) ACRYLAMIDE AND (METH) ACRYLIC ESTER CANON KABUSHIKI KAISHA (JP) 1987-08-18 US disclosed
US-4688056-A Liquid jet recording head having a layer of a resin composition curable with an active energy ray CANON KABUSHIKI KAISHA (JP) 1987-08-18 US disclosed
US-4688053-A DURABILITY CANON KABUSHIKI KAISHA (JP) 1987-08-18 US disclosed
US-4688054-A Liquid jet recording head CANON KABUSHIKI KAISHA (JP) 1987-08-18 US disclosed
EP-0209803-A2 Liquid jet recording head CANON KABUSHIKI KAISHA (JP) 1987-01-28 EP disclosed
EP-0208300-A2 Liquid jet recording head CANON KABUSHIKI KAISHA (JP) 1987-01-14 EP disclosed
EP-0206086-A2 Active energy ray-curing resin composition CANON KABUSHIKI KAISHA (JP) 1986-12-30 EP disclosed