Methacrylic Acid

Methacrylic Acid

SCHEMBL9013034

C=C(C)C(=O)O.C=CC(=O)O.CC(CO)(CO)CO

nearest known ligand 0.42

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.42
HSD17B10 Q99714 1/20 0.42
LMNA P02545 1/20 0.42
ALDH1A1 P00352 5/20 0.35
TET2 Q6N021 1/20 0.32
CYP3A4 P08684 2/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32
TP53 P04637 2/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HIF1A Q16665 1/20 0.31
TSHR P16473 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL10709208 1.00 ALOX15 (0.42) ALOX15HSD17B10LMNAALDH1A1TET2
Methacrylic Acid SCHEMBL27352277 1.00 ALOX15 (0.42) ALOX15HSD17B10LMNAALDH1A1TET2
Methacrylic Acid SCHEMBL10611895 1.00 ALOX15 (0.42) ALOX15HSD17B10LMNAALDH1A1TET2
Methacrylic Acid SCHEMBL28207335 0.89 TET2 (0.33) ALOX15HSD17B10ALDH1A1TET2
Acrylic Acid SCHEMBL11685831 0.89 LMNA (0.48) ALOX15HSD17B10LMNAALDH1A1CYP3A4
Methacrylic Acid SCHEMBL51595 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL7760915 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL1494603 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Acrylic Acid SCHEMBL3680633 0.89 LMNA (0.53) ALOX15HSD17B10LMNAALDH1A1CYP3A4
Methacrylic Acid SCHEMBL1625645 0.89 TET2 (0.38) ALDH1A1TET2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5503897-A POLYMER LAYER DERIVED FROM MULTIFUNCTIONAL MONOMER(S) HAVING AT LEAST TWO (METH)ACRYLOYLOXY GROUPS PER MOLECULE; UV RADIATION THROUGH CONTROLLING MATERIAL; ALKALI TREATMENT MITSUBISHI RAYON CO., LTD. (JP) 1996-04-02 US disclosed