SCHEMBL9013594

SCHEMBL9013594

CC(O)C(O)CSCCO

nearest known ligand 0.43

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.43
ROCK2 O75116 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL710785 0.79
SCHEMBL1148911 0.76
SCHEMBL13965469 0.76 TDP1 (0.50) TDP1ROCK2
SCHEMBL25856570 0.74
SCHEMBL927428 0.73 TDP1 (0.53) TDP1ROCK2
SCHEMBL26702540 0.72
SCHEMBL7967641 0.72 TDP1 (0.45) TDP1ROCK2
SCHEMBL13837319 0.71 TDP1 (0.39) TDP1ROCK2
SCHEMBL24098178 0.70 TDP1 (0.50) TDP1ROCK2
SCHEMBL2214299 0.70 TDP1 (0.50) TDP1ROCK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5589527-A EPOXY RESIN MODIFIED WITH CARBAMIC ACID AND SULFONIUM GROUPS FOR COATINGS NIPPON PAINT CO., LTD. (JP) 1996-12-31 US disclosed
EP-0662500-A2 Sulfonium group-containing pigment grinding resin and pigment paste for electrodeposition paint Nippon Paint Co., Ltd. (JP) 1995-07-12 EP disclosed