SCHEMBL901436

SCHEMBL901436

O=COC12CCC(CC1)CC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17414870 0.87
SCHEMBL152753 0.85
SCHEMBL3854945 0.83
SCHEMBL20699278 0.80
SCHEMBL17414868 0.78
SCHEMBL11714549 0.68
SCHEMBL8864 0.68 NPSR1 (0.43)
SCHEMBL7366664 0.67
SCHEMBL9799383 0.66
SCHEMBL20699280 0.65 NPSR1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230295373-A1 THERMOPLASTIC RESIN COMPOSITION FOR OPTICAL MATERIAL, MOLDED ARTICLE, COMPOUNDING AGENT, METHOD FOR PRODUCING THERMOPLASTIC RESIN COMPOSITION, AND METHOD FOR IMPROVING TRANSMISSIVITY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-09-21 US disclosed
EP-4198092-A1 THERMOPLASTIC RESIN COMPOSITION FOR OPTICAL MATERIAL, MOLDED ARTICLE, COMPOUNDING AGENT, METHOD FOR PRODUCING THERMOPLASTIC RESIN COMPOSITION, AND METHOD FOR IMPROVING TRANSMISSIVITY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-06-21 EP disclosed
WO-2023068290-A1 THERMOPLASTIC RESIN COMPOSITION, MOLDED ARTICLE, AND METHOD FOR PRODUCING AND METHOD FOR IMPROVING TRANSMITTANCE OF THERMOPLASTIC RESIN COMPOSITION 三菱瓦斯化学株式会社 2023-04-27 WO disclosed
US-9751827-B2 Method for alkylation of amines TAKASAGO INTERNATIONAL CORPORATION (JP) 2017-09-05 US disclosed
US-20160009632-A1 METHOD FOR ALKYLATION OF AMINES TAKASAGO INTERNATIONAL CORPORATION (JP) 2016-01-14 US disclosed
EP-2966057-A1 METHOD FOR ALKYLATION OF AMINES Takasago International Corporation (JP) 2016-01-13 EP disclosed
EP-2685984-A2 TETRACYCLIC XANTHENE DERIVATIVES AND METHODS OF USE THEREOF FOR THE TREATMENT OF VIRAL DISEASES Merck Sharp & Dohme Corp. (US) 2014-01-22 EP disclosed
EP-2621279-A1 FUSED TETRACYCLE DERIVATIVES AND METHODS OF USE THEREOF FOR THE TREATMENT OF VIRAL DISEASES Merck Sharp & Dohme Corp. (US) 2013-08-07 EP disclosed
EP-2621932-A1 TETRACYCLIC HETEROCYCLE COMPOUNDS FOR TREATING HEPATITIS C VIRAL INFECTION Merck Sharp & Dohme Corp. (US) 2013-08-07 EP disclosed
WO-2012122716-A1 TETRACYCLIC XANTHENE DERIVATIVES AND METHODS OF USE THEREOF FOR TREATMENT OF VIRAL DISEASES MERCK SHARP & DOHME CORP. (US) 2012-09-20 WO disclosed
WO-2012040923-A1 TETRACYCLIC INDOLE DERIVATIVES AND METHODS OF USE THEREOF FOR THE TREATMENT OF VIRAL DISEASES MERCK SHARP & DOHME CORP. (US) 2012-04-05 WO disclosed
US-6476240-B2 POLYMERS DERIVED FROM AN UNSATURATED FUSED CYCLIC HYDROCARBON (SUCH AS PERHYDRO-2,3-DIDEHYDRO-1,4:5,8-DIMETHANONAPHTHALENE) JOINED BY A LINKER TO AN ESTER GROUP HAVING ONE OR TWO PROTECTED HYDROXYLS; USE AS PHOTORESIST WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2002-11-05 US disclosed
US-20020042531-A1 Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2002-04-11 US disclosed
US-6331602-B1 Monomer and a polymer obtained therefrom WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2001-12-18 US disclosed
EP-0875496-B1 Acrylic or methacrylic acid derivatives and polymers obtained therefrom WAKO PURE CHEM IND LTD (JP) 2001-11-07 EP disclosed
US-6160068-A Monomer and a polymer obtained therefrom WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-12-12 US disclosed
US-6143472-A Resist composition and a method for formation of a pattern using the composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-11-07 US disclosed
EP-0918048-A1 A novel monomer and a polymer obtained therefrom Wako Pure Chemical Industries, Ltd. (JP) 1999-05-26 EP disclosed
EP-0875789-A1 Resist composition and its use for forming pattern WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1998-11-04 EP disclosed
EP-0875496-A1 Acrylic or methacrylic acid derivatives and polymers obtained therefrom WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1998-11-04 EP disclosed