⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL891709 | 0.74 | — | — | |
| SCHEMBL23733172 | 0.74 | — | — | |
| SCHEMBL11814950 | 0.71 | — | — | |
| SCHEMBL568947 | 0.71 | ALDH1A1 (0.33) | — | |
| SCHEMBL1766883 | 0.71 | — | — | |
| SCHEMBL8417203 | 0.69 | — | — | |
| SCHEMBL8603984 | 0.69 | — | — | |
| SCHEMBL6121306 | 0.69 | ALDH1A1 (0.30) | — | |
| SCHEMBL14281508 | 0.69 | LMNA (0.31) | — | |
| SCHEMBL11263421 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109020778-A | The manufacturing method of dry etching gases | 大金工业株式会社 | 2018-12-18 | — | — | CN | claimed |
| US-10011553-B2 | Method for producing dry etching gas | DAIKIN INDUSTRIES, LTD. (JP) | 2018-07-03 | — | — | US | claimed |
| US-20150299088-A1 | METHOD FOR PRODUCING DRY ETCHING GAS | DAIKIN INDUSTRIES, LTD. (JP) | 2015-10-22 | — | — | US | claimed |
| CN-104781220-A | Method for producing dry etching gas | DAIKIN IND LTD | 2015-07-15 | — | — | CN | claimed |
| CN-112500262-A | Process for producing fluoromethane | 大金工业株式会社 | 2021-03-16 | — | — | CN | disclosed |
| US-20200172456-A1 | COMPOSITION INCLUDING FLUOROMETHANE AND METHOD FOR PRODUCING SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2020-06-04 | — | — | US | disclosed |
| US-10597343-B2 | Composition including fluoromethane and method for producing same | DAIKIN INDUSTRIES, LTD. (JP) | 2020-03-24 | — | — | US | disclosed |
| US-10392327-B2 | Methyl fluoride production method | DAIKIN INDUSTRIES, LTD. (JP) | 2019-08-27 | — | — | US | disclosed |
| CN-109020778-A | The manufacturing method of dry etching gases | 大金工业株式会社 | 2018-12-18 | — | — | CN | disclosed |
| US-10011553-B2 | Method for producing dry etching gas | DAIKIN INDUSTRIES, LTD. (JP) | 2018-07-03 | — | — | US | disclosed |
| US-10011553-B2 | Method for producing dry etching gas | DAIKIN INDUSTRIES, LTD. (JP) | 2018-07-03 | — | — | US | disclosed |
| US-20180141886-A1 | COMPOSITION INCLUDING FLUOROMETHANE AND METHOD FOR PRODUCING SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2018-05-24 | — | — | US | disclosed |
| CN-104781220-A | Method for producing dry etching gas | DAIKIN IND LTD | 2015-07-15 | — | — | CN | disclosed |
| CN-104781220-A | Method for producing dry etching gas | DAIKIN IND LTD | 2015-07-15 | — | — | CN | disclosed |
| WO-2014077246-A1 | METHOD FOR PRODUCING DRY ETCHING GAS | ダイキン工業株式会社 (JP) | 2014-05-22 | — | — | WO | disclosed |
| CN-1141623-A | Production of hexafluoroacetone and its oxime | MINNESOTA MINING & MFG (US) | 1997-01-29 | — | — | CN | disclosed |
| EP-0748308-A1 | PRODUCTION OF HEXAFLUOROACETONE AND ITS OXIME | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-12-18 | — | — | EP | disclosed |
| US-5466879-A | From perfluoroisobutene and trialkylamine, hydrolysis, solvent complex | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-11-14 | — | — | US | disclosed |
| WO-1995023124-A1 | PRODUCTION OF HEXAFLUOROACETONE AND ITS OXIME | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-08-31 | — | — | WO | disclosed |
| US-4357282-A | CONTACTING A FLUORINATED METHYL OR ETHYL EHTER HAVING A METHOXYLATED CARBON ATOM WITH A LEWIS ACID CATALYST ACYLATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-11-02 | — | — | US | disclosed |