SCHEMBL902827

SCHEMBL902827

COc1cccc(OCC[O])c1OC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.57
MAPK1 P28482 2/20 0.46
ALDH1A1 P00352 2/20 0.45
LMNA P02545 4/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
L3MBTL1 Q9Y468 3/20 0.44
TSHR P16473 1/20 0.44
POLB P06746 1/20 0.44
MAPT P10636 2/20 0.43
HPGD P15428 2/20 0.43
NFE2L2 Q16236 1/20 0.42
HTR1A P08908 2/20 0.42
ADRA1D P25100 2/20 0.42
ADRA1A P35348 2/20 0.42
ADRA1B P35368 2/20 0.42
ABCB1 P08183 1/20 0.42
GAA P10253 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2096486 0.84 SMN1; SMN2 (0.55) SMN1; SMN2MAPK1ALDH1A1L3MBTL1TSHR
SCHEMBL9440922 0.82 LMNA (0.61) SMN1; SMN2MAPK1ALDH1A1LMNANPC1
SCHEMBL13617359 0.81 SMN1; SMN2 (0.57) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL11105088 0.81 SMN1; SMN2 (0.57) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL11092732 0.79 SMN1; SMN2 (0.60) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL25434306 0.78 CA1 (0.61) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL151213 0.78 CA1 (0.61) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL27753904 0.78 CA1 (0.61) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL7819615 0.78 SMN1; SMN2 (0.58) SMN1; SMN2MAPK1ALDH1A1LMNAMEN1
SCHEMBL12129060 0.78 SMN1; SMN2 (0.57) SMN1; SMN2MAPK1ALDH1A1L3MBTL1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014003207-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2014-01-03 WO disclosed
WO-2013069812-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-16 WO disclosed
WO-2012043866-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-04-05 WO disclosed