Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGLN1 | Q9GZT9 | 4/20 | 0.46 |
| ▸ | KDM2A | Q9Y2K7 | 4/20 | 0.46 |
| ▸ | KDM6B | O15054 | 2/20 | 0.46 |
| ▸ | KDM5C | P41229 | 2/20 | 0.46 |
| ▸ | PHF8 | Q9UPP1 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 5/20 | 0.43 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.43 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.43 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.40 |
| ▸ | GABRP | O00591 | 2/20 | 0.39 |
| ▸ | GABRD | O14764 | 2/20 | 0.39 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.39 |
| ▸ | GABRB1 | P18505 | 2/20 | 0.39 |
| ▸ | GABRG2 | P18507 | 2/20 | 0.39 |
| ▸ | GABRB3 | P28472 | 2/20 | 0.39 |
| ▸ | GABRA5 | P31644 | 2/20 | 0.39 |
| ▸ | GABRA3 | P34903 | 2/20 | 0.39 |
| ▸ | GABRA2 | P47869 | 2/20 | 0.39 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.39 |
| ▸ | GABRA4 | P48169 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL902896 | 0.90 | LMNA (0.43) | EGLN1KDM2AKDM6BKDM5CPHF8 | |
| Acrylic Acid SCHEMBL25245728 | 0.88 | EGLN1 (0.38) | EGLN1KDM2AKDM6BKDM5CPHF8 | |
| SCHEMBL902524 | 0.86 | TSHR (0.50) | LMNATSHROR51E2 | |
| SCHEMBL27324519 | 0.85 | LMNA (0.52) | LMNATSHROR51E2 | |
| SCHEMBL28798937 | 0.85 | LMNA (0.52) | LMNATSHROR51E2 | |
| SCHEMBL191308 | 0.83 | LMNA (0.54) | EGLN1KDM2AKDM6BKDM5CPHF8 | |
| SCHEMBL24454652 | 0.83 | EGLN1 (0.48) | EGLN1KDM2AKDM6BKDM5CPHF8 | |
| SCHEMBL4245440 | 0.82 | KDM2A (0.43) | EGLN1KDM2AKDM6BKDM5CPHF8 | |
| SCHEMBL11018187 | 0.82 | EGLN1 (0.43) | EGLN1KDM2AKDM6BKDM5CPHF8 | |
| SCHEMBL2914094 | 0.81 | TSHR (0.62) | LMNACYP1A2TSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113980252-B | Continuous production method of modified poly (butylene succinate) | 上海师范大学 | 2023-09-01 | — | — | CN | claimed |
| CN-113980252-A | Continuous production method of modified poly (butylene succinate) | 上海师范大学 | 2022-01-28 | — | — | CN | claimed |
| EP-3805327-B1 | ANTIFOULING PAINT COMPOSITION | MITSUBISHI CHEM CORP (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12482822-B2 | Secondary battery electrode binder, secondary battery electrode mixture layer composition, secondary battery electrode and secondary battery | TOAGOSEI CO., LTD. (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12350684-B2 | Production method and production device for resin powder or inorganic powder | TOAGOSEI CO., LTD. (JP) | 2025-07-08 | — | — | US | disclosed |
| US-20250201845-A1 | POWDERY BINDER FOR SECONDARY BATTERY POSITIVE ELECTRODE AND USE OF SAME | TOAGOSEI CO., LTD. (JP) | 2025-06-19 | — | — | US | disclosed |
| CN-112997341-B | Binder for secondary battery electrode and use thereof | 东亚合成株式会社 | 2025-06-03 | — | — | CN | disclosed |
| WO-2025047885-A1 | RESIN COMPOSITION | 三菱ケミカル株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025033218-A1 | BINDER FOR SECONDARY BATTERY ELECTRODES AND USE OF SAME | 東亞合成株式会社 | 2025-02-13 | — | — | WO | disclosed |
| WO-2025033219-A1 | SECONDARY BATTERY ELECTRODE BINDER AND USE OF SAME | 東亞合成株式会社 | 2025-02-13 | — | — | WO | disclosed |
| US-20250041875-A1 | PRODUCTION METHOD AND PRODUCTION DEVICE FOR RESIN POWDER OR INORGANIC POWDER | TOAGOSEI CO., LTD. (JP) | 2025-02-06 | — | — | US | disclosed |
| CN-1459049-A | Ultraviolet-curable resin composition and photosolder resist ink contaning the composition | GOO CHEMICAL CO LTD (JP) | 2003-11-26 | — | — | CN | disclosed |
| US-6541587-B1 | Saccharide-derived monomer, method for manufacturing the same and highly-dielectric polymer consisting of the said monomer | JAPAN EXLAN COMPANY LIMITED (JP) | 2003-04-01 | — | — | US | disclosed |
| CN-1100284-C | Silver halide photographic material | FUJI PHOTO FILM CO LTD (JP) | 2003-01-29 | — | — | CN | disclosed |
| US-6197907-B1 | LOW MOLECULAR WEIGHT HAVING A VERY LITTLE ODOR IS PRODUCED BY EMULSION-POLYMERIZING A RADICAL-POLYMERIZABLE UNSATURATED MONOMER AT A TEMPERATURE OF 115 DEGREES C. OR HIGHER IN THE PRESENCE OR ABSENCE OF A CHAIN TRANSFER AGENT. | NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) | 2001-03-06 | — | — | US | disclosed |
| US-6108062-A | Polymer dispersion-type liquid crystal optical device and method for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| EP-0931795-A1 | POLYMER OBTAINED BY EMULSION POLYMERIZATION METHOD | NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) | 1999-07-28 | — | — | EP | disclosed |
| US-5843332-A | Polymer dispersion-type liquid crystal optical device and method for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 1998-12-01 | — | — | US | disclosed |
| CN-1166620-A | Silver halide photographic material | FUJI PHOTO FILM CO LTD (JP) | 1997-12-03 | — | — | CN | disclosed |
| US-5479278-A | Method of making a polymer dispersed liquid crystal by electrodeposition | DAI NIPPON PRINTING CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |