Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP3 | P08254 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2914094 | 0.90 | TSHR (0.62) | LMNATSHRMAPTALDH1A1MGAM | |
| SCHEMBL902897 | 0.90 | EGLN1 (0.46) | LMNATSHRMAPK1KDM6BKDM5C | |
| SCHEMBL11641851 | 0.89 | LMNA (0.50) | LMNATSHRMAPTMAPK1ALDH1A1 | |
| SCHEMBL902522 | 0.89 | LMNA (0.56) | LMNATSHRMAPTMAPK1ALDH1A1 | |
| SCHEMBL2571714 | 0.87 | — | — | |
| SCHEMBL11696924 | 0.87 | LMNA (0.59) | LMNATSHRMAPTMAPK1ALDH1A1 | |
| SCHEMBL11854315 | 0.85 | ALDH1A1 (0.45) | LMNATSHRMAPTMAPK1ALDH1A1 | |
| SCHEMBL6008986 | 0.83 | LMNA (0.61) | LMNAMAPTMAPK1ALDH1A1MEN1 | |
| SCHEMBL10705886 | 0.82 | TET2 (0.38) | LMNATSHR | |
| SCHEMBL5349553 | 0.82 | MGAM (0.46) | LMNATSHRTP53MGAMGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113980252-A | Continuous production method of modified poly (butylene succinate) | 上海师范大学 | 2022-01-28 | — | — | CN | claimed |
| EP-1399190-B1 | PHARMACEUTICAL COMPOSITIONS COMPRISING LOW-SOLUBILITY AND ACID-SENSITIVE DRUGS AND NEUTRALIZED ACIDIC POLYMERS | BEND RES INC (US) | 2010-09-08 | — | — | EP | claimed |
| EP-3805327-B1 | ANTIFOULING PAINT COMPOSITION | MITSUBISHI CHEM CORP (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12482822-B2 | Secondary battery electrode binder, secondary battery electrode mixture layer composition, secondary battery electrode and secondary battery | TOAGOSEI CO., LTD. (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12350684-B2 | Production method and production device for resin powder or inorganic powder | TOAGOSEI CO., LTD. (JP) | 2025-07-08 | — | — | US | disclosed |
| US-20250201845-A1 | POWDERY BINDER FOR SECONDARY BATTERY POSITIVE ELECTRODE AND USE OF SAME | TOAGOSEI CO., LTD. (JP) | 2025-06-19 | — | — | US | disclosed |
| CN-112997341-B | Binder for secondary battery electrode and use thereof | 东亚合成株式会社 | 2025-06-03 | — | — | CN | disclosed |
| WO-2025047885-A1 | RESIN COMPOSITION | 三菱ケミカル株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025033218-A1 | BINDER FOR SECONDARY BATTERY ELECTRODES AND USE OF SAME | 東亞合成株式会社 | 2025-02-13 | — | — | WO | disclosed |
| WO-2025033219-A1 | SECONDARY BATTERY ELECTRODE BINDER AND USE OF SAME | 東亞合成株式会社 | 2025-02-13 | — | — | WO | disclosed |
| US-20250041875-A1 | PRODUCTION METHOD AND PRODUCTION DEVICE FOR RESIN POWDER OR INORGANIC POWDER | TOAGOSEI CO., LTD. (JP) | 2025-02-06 | — | — | US | disclosed |
| CN-1459049-A | Ultraviolet-curable resin composition and photosolder resist ink contaning the composition | GOO CHEMICAL CO LTD (JP) | 2003-11-26 | — | — | CN | disclosed |
| US-6541587-B1 | Saccharide-derived monomer, method for manufacturing the same and highly-dielectric polymer consisting of the said monomer | JAPAN EXLAN COMPANY LIMITED (JP) | 2003-04-01 | — | — | US | disclosed |
| CN-1100284-C | Silver halide photographic material | FUJI PHOTO FILM CO LTD (JP) | 2003-01-29 | — | — | CN | disclosed |
| US-6197907-B1 | LOW MOLECULAR WEIGHT HAVING A VERY LITTLE ODOR IS PRODUCED BY EMULSION-POLYMERIZING A RADICAL-POLYMERIZABLE UNSATURATED MONOMER AT A TEMPERATURE OF 115 DEGREES C. OR HIGHER IN THE PRESENCE OR ABSENCE OF A CHAIN TRANSFER AGENT. | NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) | 2001-03-06 | — | — | US | disclosed |
| US-6108062-A | Polymer dispersion-type liquid crystal optical device and method for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| EP-0931795-A1 | POLYMER OBTAINED BY EMULSION POLYMERIZATION METHOD | NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) | 1999-07-28 | — | — | EP | disclosed |
| US-5843332-A | Polymer dispersion-type liquid crystal optical device and method for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 1998-12-01 | — | — | US | disclosed |
| CN-1166620-A | Silver halide photographic material | FUJI PHOTO FILM CO LTD (JP) | 1997-12-03 | — | — | CN | disclosed |
| US-5479278-A | Method of making a polymer dispersed liquid crystal by electrodeposition | DAI NIPPON PRINTING CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |