Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11653794 | 0.90 | TSHR (0.35) | ALDH1A1TSHRHPGD | |
| SCHEMBL19456905 | 0.82 | TSHR (0.45) | ALDH1A1TSHRHPGD | |
| SCHEMBL28726869 | 0.82 | ALDH1A1 (0.39) | ALDH1A1TSHR | |
| SCHEMBL4246013 | 0.81 | TSHR (0.33) | ALDH1A1TSHRHPGD | |
| SCHEMBL27498746 | 0.81 | ALDH1A1 (0.45) | ALDH1A1TSHR | |
| SCHEMBL2785282 | 0.79 | TSHR (0.42) | ALDH1A1TSHRHPGD | |
| SCHEMBL5691662 | 0.79 | TSHR (0.31) | TSHR | |
| SCHEMBL16008 | 0.79 | TSHR (0.50) | TSHRHPGD | |
| SCHEMBL11648876 | 0.78 | TSHR (0.35) | ALDH1A1TSHRHPGD | |
| SCHEMBL665164 | 0.77 | TSHR (0.49) | ALDH1A1TSHRHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | claimed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| CN-119768741-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-117677901-A | Positive photosensitive resin composition | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-107614542-B | Method for producing elliptical, needle-like or rod-like polymer particles | 日清纺控股株式会社 | 2020-03-03 | — | — | CN | disclosed |
| WO-2012044099-A2 | PHOTOSENSITIVE RESIN COMPOSITION | KOLON INDUSTRIES, INC. (KR) | 2012-04-05 | — | — | WO | disclosed |
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | disclosed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | disclosed |
| US-6984476-B2 | Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device | SHARP KABUSHIKI KAISHA (JP) | 2006-01-10 | — | — | US | disclosed |
| US-20030193624-A1 | Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device | SHARP KABUSHIKI KAISHA (JP) | 2003-10-16 | — | — | US | disclosed |