Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27998176 | 0.90 | ALDH1A1 (0.33) | TSHRALDH1A1 | |
| SCHEMBL9546032 | 0.88 | TSHR (0.35) | TSHRALDH1A1HPGD | |
| SCHEMBL2785282 | 0.85 | TSHR (0.42) | TSHRALDH1A1HPGD | |
| SCHEMBL11653794 | 0.84 | TSHR (0.35) | TSHRALDH1A1HPGD | |
| SCHEMBL15392339 | 0.83 | HTT (0.34) | HPGD | |
| SCHEMBL21084068 | 0.82 | ALDH1A1 (0.46) | TSHRALDH1A1HPGD | |
| SCHEMBL904504 | 0.81 | ALDH1A1 (0.38) | TSHRALDH1A1HPGD | |
| SCHEMBL3675161 | 0.80 | TSHR (0.39) | TSHRALDH1A1HPGD | |
| SCHEMBL561301 | 0.78 | TSHR (0.45) | TSHRALDH1A1HPGD | |
| SCHEMBL28844208 | 0.78 | ALDH1A1 (0.33) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7611826-B2 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-11-03 | — | — | US | claimed |
| US-20090191484-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-30 | — | — | US | claimed |
| US-20040115558-A1 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | DONGJIM SEMICHEM CO., LTD. (KR) | 2004-06-17 | — | — | US | claimed |
| US-5061587-A | Image fixing at high speed | RICOH COMPANY LTD. (JP) | 1991-10-29 | — | — | US | claimed |
| US-4855215-A | Photosetting polymer composition | UBE INDUSTRIES, LTD. (JP) | 1989-08-08 | — | — | US | claimed |
| US-7611826-B2 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-11-03 | — | — | US | disclosed |
| US-20090191484-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-30 | — | — | US | disclosed |
| US-7513942-B2 | Fine particle dispersion, ink composition using the same, and ink-jet recording method | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20050206713-A1 | Fine particle dispersion, ink composition using the same, and ink-jet recording method | FUJI PHOTO FILM CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| US-20040115558-A1 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | DONGJIM SEMICHEM CO., LTD. (KR) | 2004-06-17 | — | — | US | disclosed |
| US-20020177071-A1 | Method for forming image and apparatus for forming image | MITSUBISHI CHEMICAL CORPORATION (JP) | 2002-11-28 | — | — | US | disclosed |
| US-5061587-A | Image fixing at high speed | RICOH COMPANY LTD. (JP) | 1991-10-29 | — | — | US | disclosed |