SCHEMBL9058747

SCHEMBL9058747

CCCCCC(=O)OCC.[InH3]

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.68
CYP1A2 P05177 1/20 0.61
PAM P19021 2/20 0.61
TSHR P16473 2/20 0.57
MAPT P10636 1/20 0.57
LMNA P02545 4/20 0.55
ALDH1A1 P00352 2/20 0.55
DNM1 Q05193 1/20 0.55
KDM4E B2RXH2 1/20 0.53
DUSP3 P51452 1/20 0.53
MEN1 O00255 1/20 0.53
KMT2A Q03164 1/20 0.53
PRKCA P17252 1/20 0.50
PRKCE Q02156 1/20 0.50
PRKCQ Q04759 1/20 0.50
PRKCD Q05655 1/20 0.50
MGAM O43451 1/20 0.50
GAA P10253 1/20 0.50
SI P14410 1/20 0.50
MGAM2 Q2M2H8 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31352662 0.98 DGKA (0.71) DGKACYP1A2PAMTSHRMAPT
SCHEMBL37297 0.98 DGKA (0.71) DGKACYP1A2PAMTSHRMAPT
SCHEMBL2558423 0.95 DGKA (0.68) DGKACYP1A2PAMTSHRMAPT
SCHEMBL1506909 0.95 DGKA (0.68) DGKACYP1A2PAMTSHRMAPT
SCHEMBL8375548 0.95 DGKA (0.75) DGKACYP1A2PAMTSHRMAPT
SCHEMBL19252993 0.95 DGKA (0.68) DGKACYP1A2PAMTSHRMAPT
Hexane SCHEMBL2349171 0.95 DGKA (0.75) DGKACYP1A2PAMTSHRMAPT
SCHEMBL454 0.95 DGKA (0.75) DGKACYP1A2PAMTSHRMAPT
SCHEMBL2309907 0.95 DGKA (0.68) DGKACYP1A2PAMTSHRMAPT
SCHEMBL22129520 0.95 DGKA (0.68) DGKACYP1A2PAMTSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8292167-A None JP disclosed
JP-4275996-A None JP disclosed
CN-110431656-A Coating liquid for forming metal oxide film, field effect transistor and method for producing the same RICOH CO LTD 2019-11-08 CN disclosed
CN-109937223-A Polycarbonate base class polyalcohol 陶氏环球技术有限责任公司 2019-06-25 CN disclosed
CN-108886058-A Field effect transistor, display element, image display device and system 株式会社理光 2018-11-23 CN disclosed
CN-108368342-A Curable silicone resin composition and its solidfied material and optical semiconductor device 株式会社大赛璐 2018-08-03 CN disclosed
CN-108028270-A For forming coating fluid, n-type oxide semiconductor film manufacture method and the manufacturing method for field effect transistor of n-type oxide semiconductor film 株式会社理光 2018-05-11 CN disclosed
CN-105190854-B Coating liquid for forming metal oxide film, field effect transistor, and method for manufacturing field effect transistor 株式会社理光 2018-01-30 CN disclosed
CN-103998488-B Process for making hybrid polyester-polyether polyols 陶氏环球技术有限责任公司 2017-05-24 CN disclosed
CN-104487520-B Curable organopolysiloxane composition, method for producing same, method for producing organopolysiloxane cured product, method for condensing organopolysiloxane, optical semiconductor sealed body, and condensation catalyst for organopolysiloxane 三菱化学株式会社 2017-03-15 CN disclosed
CN-102232232-A Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising same SUMITOMO METAL MINING CO 2011-11-02 CN disclosed
CN-100354380-C Conductive ink composition, reflective member, circuit substrate, and electronic apparatus SHARP KK (JP) 2007-12-12 CN disclosed
CN-101031618-A Curable composition TORAY FINECHEMICALS CO LTD (JP) 2007-09-05 CN disclosed
CN-1906526-A Method for gravure printing transparent electrodes, and ink composition therefor KONINKL PHILIPS ELECTRONICS NV (NL) 2007-01-31 CN disclosed
CN-1712464-A Conductive ink composition, reflective member, circuit substrate, and electronic apparatus SHARP KK (JP) 2005-12-28 CN disclosed
CN-1535946-A Low melting pant tin carboxylate and its manufacturing method 日本油脂株式会社 2004-10-13 CN disclosed
JP-H08292167-A OZONE SENSOR MATSUSHITA ELECTRIC IND CO LTD 1996-11-05 JP disclosed
US-5252356-A Method of producing transparent zinc oxide films THE HONJO CHEMICAL CORPORATION (JP) 1993-10-12 US disclosed
JP-H04275996-A CHEMICAL VAPOR GROWTH METHOD MARUYAMA TOSHIRO 1992-10-01 JP disclosed
EP-0500397-A2 Method of producing transparent zinc oxide films THE HONJO CHEMICAL CORPORATION (JP) 1992-08-26 EP disclosed