Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | XPO1 | O14980 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL906414 | 0.84 | — | — | |
| SCHEMBL13414793 | 0.82 | — | — | |
| SCHEMBL9578357 | 0.81 | POLB (0.38) | HTTALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL29038819 | 0.81 | — | — | |
| SCHEMBL9578252 | 0.81 | HTT (0.38) | HTTALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL23979702 | 0.81 | HTT (0.45) | HTT | |
| SCHEMBL10204704 | 0.81 | HTT (0.45) | HTT | |
| SCHEMBL9546008 | 0.81 | HTT (0.45) | HTT | |
| SCHEMBL3865740 | 0.79 | THRB (0.41) | ALDH1A1TSHRTHRBSOAT1 | |
| SCHEMBL36595 | 0.78 | TSHR (0.48) | HTTALDH1A1TSHRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116003659-A | Hydrophobic polymer, preparation method thereof, coating material containing hydrophobic polymer and method for constructing hydrophobic/super-hydrophobic surface by using hydrophobic polymer | 中国科学院过程工程研究所 | 2023-04-25 | — | — | CN | claimed |
| EP-3991988-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM Corporation (JP) | 2022-05-04 | — | — | EP | disclosed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| EP-1806370-B1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| EP-2277929-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2315078-B1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| US-20120164586-A1 | PATERN FORMING METHOD | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20100266953-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100203452-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-5235013-A | Copolymerizing an alkene of 6-10 carbons having one double bond and a side chain methyl group and an acrylic or fluoroacrylic ester | CIBA-GEIGY CORPORATION | 1993-08-10 | — | — | US | disclosed |
| EP-0478261-A2 | Process for producing oxygen-permeable polymer | CIBA-GEIGY AG (CH) | 1992-04-01 | — | — | EP | disclosed |
| US-4859793-A | Process for the production of fluoroalkyl acrylates | SOCIETE CHIMIQUE DES CHARBONNAGES S.A. (FR) | 1989-08-22 | — | — | US | disclosed |