SCHEMBL9065421

SCHEMBL9065421

Oc1ccc(C2(c3ccc(O)cc3)CCC(C3CCCCC3)CC2)cc1

nearest known ligand 0.64

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 8/20 0.64
ESR1 P03372 5/20 0.64
ALDH1A1 P00352 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
OPRM1 P35372 2/20 0.37
KMT2A Q03164 1/20 0.37
EPHX1 P07099 1/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL45825 0.92 ESR2 (0.64) ESR2ESR1ALDH1A1L3MBTL1KMT2A
SCHEMBL10436113 0.90 ESR2 (0.53) ESR2ESR1ALDH1A1L3MBTL1OPRM1
SCHEMBL13379646 0.89 ESR2 (0.52) ESR2ESR1OPRM1KMT2A
SCHEMBL11052718 0.89 ESR2 (0.52) ESR2ESR1OPRM1KMT2A
SCHEMBL9065902 0.84 ESR2 (0.58) ESR2ESR1ALDH1A1L3MBTL1OPRM1
SCHEMBL8148479 0.83 ESR2 (0.53) ESR2ESR1ALDH1A1L3MBTL1
SCHEMBL9348569 0.81 ESR2 (0.52) ESR2ESR1ALDH1A1KMT2A
SCHEMBL9352654 0.81 ESR2 (0.52) ESR2ESR1ALDH1A1KMT2A
SCHEMBL10317542 0.81 ESR2 (0.71) ESR2ESR1ALDH1A1L3MBTL1OPRM1
SCHEMBL9353899 0.81 ESR2 (0.60) ESR2ESR1ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8338078-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-25 US disclosed
US-20100104977-A1 PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-29 US disclosed
EP-0465967-B1 Continuous separation of aromatic polycarbonates in semicrystalline form from CH2Cll2 solutions BAYER AG (DE) 1996-04-03 EP disclosed
EP-0469403-B1 High molecular weight polyester based on 1,1-bis-(4-hydroxyphenyl)-alkylcycloalkanes and thermoplastic blends thereof BAYER AG (DE) 1996-02-28 EP disclosed
EP-0469404-B1 Polyestercarbonates based on 1,1-bis-(4-hydroxyphenyl)-alkylcycloalkanes and thermoplastic blends thereof BAYER AG (DE) 1996-02-28 EP disclosed
US-5489571-A CROP-SAFE COMPOUNDS EFFECTIVE AT LOW CONCENTRATIONS MONSANTO COMPANY (US) 1996-02-06 US disclosed
EP-0389092-B1 Liquid crystal-aligning coating and liquid crystal element CHISSO CORP (JP) 1994-09-07 EP disclosed
US-5152918-A Cyclohexyl aromatic polyimides; controlling pretilt angle CHISSO CORPORATION (JP) 1992-10-06 US disclosed
EP-0469404-A2 Polyestercarbonates based on 1,1-bis-(4-hydroxyphenyl)-alkylcycloalkanes and thermoplastic blends thereof BAYER AG (DE) 1992-02-05 EP disclosed
EP-0465967-A2 Continuous separation of aromatic polycarbonates in semicrystalline form from CH2Cll2 solutions BAYER AG (DE) 1992-01-15 EP disclosed
US-5034457-A Polycarbonate for use in molding materials for laminated films and for electronics BAYER AKTIENGESELLSCHAFT (DE) 1991-07-23 US disclosed
US-5010163-A Molding materials BAYER AKTIENGESELLSCHAFT (DE) 1991-04-23 US disclosed
EP-0389092-A1 Liquid crystal-aligning coating and liquid crystal element CHISSO CORPORATION (JP) 1990-09-26 EP disclosed
EP-0387593-A2 Thermoplastic alloys of polycarbonates based on substituted cyclohexylidenbisphenols BAYER AG (DE) 1990-09-19 EP disclosed
EP-0374630-A2 Polycarbonates from cyclohexylidene diphenols BAYER AG (DE) 1990-06-27 EP disclosed