SCHEMBL45825

SCHEMBL45825

Oc1ccc(C2(c3ccc(O)cc3)CCC(C3CCC(c4ccc(O)cc4)(c4ccc(O)cc4)CC3)CC2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 12/20 0.64
ESR1 P03372 5/20 0.64
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
NPC1 O15118 1/20 0.36
CA12 O43570 1/20 0.36
GMNN O75496 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
LMNA P02545 1/20 0.36
CA3 P07451 1/20 0.36
CYP3A4 P08684 1/20 0.36
MAPT P10636 1/20 0.36
TYR P14679 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
NFKB1 P19838 1/20 0.36
CA4 P22748 1/20 0.36
CA5A P35218 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9065421 0.92 ESR2 (0.64) ESR2ESR1ALDH1A1NPC1RAB9A
SCHEMBL8148479 0.90 ESR2 (0.53) ESR2ESR1ALDH1A1L3MBTL1
SCHEMBL9352654 0.89 ESR2 (0.52) ESR2ESR1ALDH1A1MAPTHPGD
SCHEMBL9348579 0.89 ESR2 (0.52) ESR2ESR1ALDH1A1MAPTHPGD
SCHEMBL9348569 0.89 ESR2 (0.52) ESR2ESR1ALDH1A1MAPTHPGD
SCHEMBL14922954 0.86 ESR2 (0.48) ESR2ESR1ALDH1A1KDM4EMEN1
SCHEMBL9348671 0.86 ESR2 (0.48) ESR2ESR1CYP3A4
SCHEMBL9348750 0.86 ESR2 (0.48) ESR2ESR1CYP3A4
SCHEMBL9348682 0.86 ESR2 (0.48) ESR2ESR1CYP3A4
SCHEMBL13379646 0.85 ESR2 (0.52) ESR2ESR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269255-B2 Photosensitive composition and color converting film MERCK PATENT GMBH (DE) 2022-03-08 US disclosed
US-20210395461-A1 RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, PATTERNED CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2021-12-23 US disclosed
EP-3356888-B1 A PHOTOSENSITIVE COMPOSITION AND COLOR CONVERTING FILM MERCK PATENT GMBH (DE) 2021-03-03 EP disclosed
US-10916661-B2 Thin film transistor substrate provided with protective film and method for producing same MERCK PATENT GMBH (DE) 2021-02-09 US disclosed
US-20200319557-A1 PHOTOSENSITIVE COMPOSITION AND COLOR CONVERTING FIILM MERCK PATENT GMBH (DE) 2020-10-08 US disclosed
US-20200201179-A1 PHOTOSENSITIVE SILOXANE COMPOSITION AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2020-06-25 US disclosed
US-10678134-B2 Photosensitive composition and color converting film MERCK PATENT GMBH (DE) 2020-06-09 US disclosed
EP-3203320-B9 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TORAY INDUSTRIES (JP) 2020-05-06 EP disclosed
WO-2020045214-A1 RESIN COMPOSITION AND CURED FILM OBTAINED THEREFROM 東レ株式会社 2020-03-05 WO disclosed
EP-3203320-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE TORAY INDUSTRIES (JP) 2019-10-23 EP disclosed
US-20100129618-A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM TORAY INDUSTRIES, INC. (JP) 2010-05-27 US disclosed
US-20100129618-A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM TORAY INDUSTRIES, INC. (JP) 2010-05-27 US disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed
EP-1391296-B1 Presensitized lithographic plate comprising microcapsules FUJIFILM CORP (JP) 2008-03-26 EP disclosed
US-7196232-B2 4,4′-dihydroxyphenyl bicyclohexenes HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2007-03-27 US disclosed
US-7196232-B2 4,4′-dihydroxyphenyl bicyclohexenes HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2007-03-27 US disclosed
US-7196232-B2 4,4′-dihydroxyphenyl bicyclohexenes HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2007-03-27 US disclosed
US-20060129001-A1 Novel 4,4'-dihydroxyphenyl bicyclohexenes HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2006-06-15 US disclosed
JP-2000034248-A NEW 4-NUCLIDE POLYPHENOL COMPOUND HONSHU CHEM IND CO LTD 2000-02-02 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060129001-A1 Novel 4,4'-dihydroxyphenyl bicyclohexenes DBF4, DCUN1D4, SDC4 ESR2 2548/4885ESR1 1397/4885ALDH1A1 3182/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.