SCHEMBL9066827

SCHEMBL9066827

CC(C)C1CCC(OCC2CO2)CC1

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
HCRTR2 O43614 16/20 0.39
TSHR P16473 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.37
ALDH1A1 P00352 2/20 0.36
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26938153 0.89 TSHR (0.38) HCRTR2TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL805166 0.89 TSHR (0.38) HCRTR2TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL7083176 0.84 TSHR (0.40) TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL15683200 0.84 SMN1; SMN2 (0.38) HCRTR2TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL733109 0.83 TSHR (0.50) TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL9066859 0.81 SMN1; SMN2 (0.39) TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL9918909 0.81 SMN1; SMN2 (0.33) TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL28385789 0.81
SCHEMBL24046936 0.81 TSHR (0.42) TSHRSMN1; SMN2ALDH1A1TDP1
SCHEMBL13707142 0.79 MEN1 (0.37) TSHRSMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230129765-A1 METHOD FOR PRODUCING POLYTHIOETHER COMPOUND DAICEL CORPORATION (JP) 2023-04-27 US disclosed
EP-4108705-A1 METHOD FOR PRODUCING POLYTHIOETHER COMPOUND Daicel Corporation (JP) 2022-12-28 EP disclosed
CN-115135697-A Process for producing polythioether compound 株式会社大赛璐 2022-09-30 CN disclosed
US-9000110-B2 Fluoroalkyl group-containing n-substituted (meth)acrylamide compound, polymer thereof, and use thereof AGC SEIMI CHEMICAL CO., LTD. (JP) 2015-04-07 US disclosed
EP-0430209-B1 Resin composition for cast polymerization MITSUBISHI RAYON CO (JP) 1996-02-28 EP disclosed
US-5247038-A Optical materials MITSUBISHI RAYON CO., LTD. (JP) 1993-09-21 US disclosed
EP-0430209-A2 Resin composition for cast polymerization MITSUBISHI RAYON CO., LTD. (JP) 1991-06-05 EP disclosed