⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL369623 | 0.91 | TSHR (0.39) | — | |
| SCHEMBL14714228 | 0.88 | TSHR (0.44) | — | |
| SCHEMBL8967219 | 0.80 | — | — | |
| SCHEMBL1418560 | 0.75 | ANPEP (0.43) | — | |
| SCHEMBL14983319 | 0.73 | ANPEP (0.41) | — | |
| SCHEMBL12042260 | 0.73 | — | — | |
| SCHEMBL10942095 | 0.73 | ANPEP (0.41) | — | |
| SCHEMBL8610175 | 0.73 | — | — | |
| SCHEMBL4274113 | 0.73 | ANPEP (0.41) | — | |
| SCHEMBL7129181 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116063604-B | Bimodal polyethylene resin for pipe material product, preparation method thereof and pipe material product | 中国石油化工股份有限公司 | 2024-11-19 | — | — | CN | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| CN-116063604-A | Bimodal polyethylene resin for pipe material product, preparation method thereof and pipe material product | 中国石油化工股份有限公司 | 2023-05-05 | — | — | CN | disclosed |
| US-20230127914-A1 | RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| CN-109963827-A | The method for preparing paraxylene by the methylation of toluene and/or benzene | 埃克森美孚化学专利公司 | 2019-07-02 | — | — | CN | disclosed |
| US-8945820-B2 | Silicon-containing resist underlayer film-forming composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20030009046-A1 | Preparation of preparing substituted indanones | EQUISTAR CHEMICALS, LP | 2003-01-09 | — | — | US | disclosed |
| EP-0519496-B1 | Thermosetting copolymers, silicon carbide-based fiber and processes for producing same | TONEN CORP (JP) | 1996-05-22 | — | — | EP | disclosed |
| EP-0404503-B1 | Boron-containing, silicon nitride-based ceramic shaped body production process | TONEN CORP (JP) | 1996-03-06 | — | — | EP | disclosed |
| EP-0389084-B1 | Process for producing a polyborosilazane | TONEN CORP (JP) | 1995-09-20 | — | — | EP | disclosed |
| US-5292830-A | Silane, silazane, boron block crosslinked copolymers | TONEN CORPORATION (JP) | 1994-03-08 | — | — | US | disclosed |
| EP-0519496-A1 | Thermosetting copolymers, silicon carbide-based fiber and processes for producing same | Tonen Corporation (JP) | 1992-12-23 | — | — | EP | disclosed |
| US-5128286-A | BORON-CONTAINING, SILICON NITRIDE-BASED CERAMIC SHAPED BODY | TONEN CORPORATION (JP) | 1992-07-07 | — | — | US | disclosed |
| US-5030744-A | Polyborosilazane and process for producing same | TONEN CORPORATION (JP) | 1991-07-09 | — | — | US | disclosed |
| EP-0404503-A1 | Boron-containing, silicon nitride-based ceramic shaped body production process | Tonen Corporation (JP) | 1990-12-27 | — | — | EP | disclosed |
| EP-0389084-A2 | Process for producing a polyborosilazane | Tonen Corporation (JP) | 1990-09-26 | — | — | EP | disclosed |