SCHEMBL369623

SCHEMBL369623

CCCCCB(OC)OC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
THRB P10828 2/20 0.39
ANPEP P15144 1/20 0.35
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
GBA1 P04062 1/20 0.34
LMNA P02545 1/20 0.33
CA1 P00915 4/20 0.32
CA2 P00918 4/20 0.32
CA9 Q16790 4/20 0.32
MEN1 O00255 1/20 0.32
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
CA12 O43570 1/20 0.32
MAPT P10636 1/20 0.32
SLC22A1 O15245 2/20 0.32
SLC22A2 O15244 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
LPAR3 Q9UBY5 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL734629 0.97 TSHR (0.44) TSHRTHRBGBA1LMNAMEN1
SCHEMBL14714228 0.97 TSHR (0.44) TSHRTHRBGBA1LMNAMEN1
SCHEMBL907653 0.91
SCHEMBL8967219 0.78
SCHEMBL18007369 0.77 TSHR (0.39) TSHRTHRBANPEPLMNAMEN1
SCHEMBL25436878 0.74
SCHEMBL24835118 0.74 TSHR (0.37) TSHRTHRBANPEPADRB2ADRB1
SCHEMBL8966752 0.74 ADRB2 (0.39) TSHRTHRBANPEPADRB2ADRB1
SCHEMBL15312386 0.72 THRB (0.42) TSHRTHRBCA1CA2CA9
SCHEMBL8966216 0.72 THRB (0.42) TSHRTHRBADRB2ADRB1ADRB3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 US disclosed
US-11754926-B2 Method of forming resist pattern, resist composition and method of producing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-20230273521-A1 CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-31 US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
US-20230127914-A1 RESIST PATTERN FORMATION METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2023-04-27 US disclosed
US-8097348-B2 Pi-conjugated organoboron polymers in thin-film organic electronic devices TDA RESEARCH, INC. (US) 2012-01-17 US disclosed
US-20090127547-A1 PI-CONJUGATED ORGANOBORON POLYMERS IN THIN-FILM ORGANIC ELECTRONIC DEVICES TDA RESEARCH, INC. 2009-05-21 US disclosed
WO-2007109629-A2 PI-CONJUGATED ORGANOBORON POLYMERS IN THIN-FILM ORGANIC ELECTRONIC DEVICES TDA RESEARCH, INC. (US) 2007-09-27 WO disclosed