SCHEMBL4274113

SCHEMBL4274113

CCCCOB(CCCC)OCCCC

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ANPEP P15144 1/20 0.41
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41
TSHR P16473 5/20 0.36
CYP3A4 P08684 2/20 0.36
ALDH1A1 P00352 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
LMNA P02545 1/20 0.33
PCSK9 Q8NBP7 1/20 0.33
ATM Q13315 1/20 0.32
THRB P10828 1/20 0.32
HPGD P15428 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8966752 0.92 ADRB2 (0.39) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL8966216 0.89 THRB (0.42) ADRB2ADRB1ADRB3TSHRALDH1A1
SCHEMBL14983314 0.88 ADRB2 (0.41) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL14983319 0.88 ANPEP (0.41) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL15312386 0.83 THRB (0.42) TSHRALDH1A1CA1CA2THRB
SCHEMBL10942095 0.82 ANPEP (0.41) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL1017192 0.80 ANPEP (0.39) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL18065841 0.79 TSHR (0.35) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL7789709 0.79 ADRB2 (0.43) ANPEPADRB2ADRB1ADRB3TSHR
SCHEMBL8966610 0.78 THRB (0.42) TSHRALDH1A1CA1CA2THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-8399570-B2 Functionalized polymers and improved tires therefrom BRIDGESTONE CORPORATION (JP) 2013-03-19 US disclosed
US-20090326161-A1 FUNCTIONALIZED POLYMERS AND IMPROVED TIRES THEREFROM BRIDGESTONE CORPORATION (JP) 2009-12-31 US disclosed
US-7598322-B1 particularly tire treads exhibiting reduced rolling resistance; a vulcanized rubbery polymer such as polybutadiene-butadiene-styrene copolymer made from living polymerization using butyllithium initiator and a tributyloxyborane as polymerization terminator BRIDGESTONE CORPORATION (JP) 2009-10-06 US disclosed
US-4085090-A Aromatic polymers containing a nitrogen-containing ring group, and process for preparation thereof TEIJIN LIMITED (JA) 1978-04-18 US disclosed