⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9104668 | 0.78 | — | — | |
| SCHEMBL9101547 | 0.77 | — | — | |
| SCHEMBL9101822 | 0.77 | HRH3 (0.30) | — | |
| SCHEMBL9101815 | 0.76 | HPGD (0.30) | — | |
| SCHEMBL28264145 | 0.76 | EPHX1 (0.37) | — | |
| SCHEMBL1949792 | 0.75 | TDP1 (0.49) | — | |
| SCHEMBL9099456 | 0.70 | — | — | |
| SCHEMBL15253582 | 0.68 | LTA4H (0.35) | — | |
| SCHEMBL8416691 | 0.68 | ALDH1A1 (0.37) | — | |
| SCHEMBL27631225 | 0.66 | TDP1 (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| CN-105093832-B | Photosensitive composition, protective film and element having protective film | 奇美实业股份有限公司 | 2019-08-30 | — | — | CN | disclosed |
| CN-104423170-B | Photosensitive polysiloxane composition, protective film and assembly with protective film | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-104345567-B | photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2019-04-02 | — | — | CN | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| CN-109062007-A | positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-108693710-A | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| CN-104945908-B | Curable resin composition and use thereof | 奇美实业股份有限公司 | 2018-04-24 | — | — | CN | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| CN-107179652-A | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2017-09-19 | — | — | CN | disclosed |
| CN-103376661-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI COR | 2013-10-30 | — | — | CN | disclosed |
| US-20130277627-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS OF THE SAME | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130260108-A1 | PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-10-03 | — | — | US | disclosed |
| US-8546061-B2 | Photo-curing polysiloxane composition and protective film formed from the same | CHI MEI CORPORATION (TW) | 2013-10-01 | — | — | US | disclosed |
| US-20130245150-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-09-19 | — | — | US | disclosed |
| US-20130228727-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2013-09-05 | — | — | US | disclosed |
| US-20130142966-A1 | BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-20130135763-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2013-05-30 | — | — | US | disclosed |
| US-20120141936-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-06-07 | — | — | US | disclosed |