SCHEMBL9104542

SCHEMBL9104542

[CH2]CCOCCCCCC(C)C1CCO1

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
SPHK2 Q9NRA0 3/20 0.31
SPHK1 Q9NYA1 2/20 0.31
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3378702 0.90 TSHR (0.34) SPHK2SPHK1ALDH1A1TDP1
SCHEMBL3382488 0.84 SMN1; SMN2 (0.31)
SCHEMBL3624736 0.79
SCHEMBL14990983 0.78
SCHEMBL11730302 0.75 EPHX1 (0.48) SPHK1ALDH1A1TDP1
SCHEMBL27811789 0.75 EPHX1 (0.48) SPHK1ALDH1A1TDP1
SCHEMBL1069062 0.73 LMNA (0.39)
SCHEMBL7850159 0.73 LMNA (0.39)
SCHEMBL17997998 0.73 LMNA (0.39)
SCHEMBL9336248 0.73 LMNA (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8546061-B2 Photo-curing polysiloxane composition and protective film formed from the same CHI MEI CORPORATION (TW) 2013-10-01 US disclosed
US-20120141936-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME CHI MEI CORPORATION (TW) 2012-06-07 US disclosed