Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9101556 | 0.87 | SMN1; SMN2 (0.32) | SMN1; SMN2 | |
| SCHEMBL9101812 | 0.80 | LTA4H (0.35) | SMN1; SMN2LMNA | |
| SCHEMBL15239861 | 0.73 | — | — | |
| SCHEMBL10322877 | 0.72 | — | — | |
| SCHEMBL28010945 | 0.70 | SMN1; SMN2 (0.33) | SMN1; SMN2EPHX1 | |
| SCHEMBL1526868 | 0.69 | — | — | |
| SCHEMBL3382030 | 0.68 | EPHX1 (0.39) | SMN1; SMN2EPHX1 | |
| SCHEMBL14954562 | 0.67 | — | — | |
| SCHEMBL9104681 | 0.67 | — | — | |
| SCHEMBL3379488 | 0.66 | EPHX1 (0.42) | SMN1; SMN2EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107885034-B | Negative white photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-105319852-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2020-06-26 | — | — | CN | disclosed |
| CN-106909028-B | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2020-06-05 | — | — | CN | disclosed |
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| CN-104950580-B | Photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2020-01-03 | — | — | CN | disclosed |
| CN-110320755-A | Minus white photosensitive resin composition and its application | 奇美实业股份有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-105093832-B | Photosensitive composition, protective film and element having protective film | 奇美实业股份有限公司 | 2019-08-30 | — | — | CN | disclosed |
| CN-104423170-B | Photosensitive polysiloxane composition, protective film and assembly with protective film | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-104345567-B | photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2019-04-02 | — | — | CN | disclosed |
| CN-109116681-A | Chemically amplified positive photosensitive resin composition, photoresist pattern and method for forming the same, and electronic device | 奇美实业股份有限公司 | 2019-01-01 | — | — | CN | disclosed |
| CN-103376661-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI COR | 2013-10-30 | — | — | CN | disclosed |
| US-20130277627-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS OF THE SAME | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130260108-A1 | PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-10-03 | — | — | US | disclosed |
| US-8546061-B2 | Photo-curing polysiloxane composition and protective film formed from the same | CHI MEI CORPORATION (TW) | 2013-10-01 | — | — | US | disclosed |
| US-20130245150-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-09-19 | — | — | US | disclosed |
| US-20130228727-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2013-09-05 | — | — | US | disclosed |
| US-20130142966-A1 | BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-20130135763-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2013-05-30 | — | — | US | disclosed |
| US-20120141936-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-06-07 | — | — | US | disclosed |