Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 3/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.31 |
| ▸ | MAPT | P10636 | 3/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | DPP4 | P27487 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.31 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9104673 | 0.80 | SMN1; SMN2 (0.33) | LMNASMN1; SMN2 | |
| SCHEMBL9101556 | 0.79 | SMN1; SMN2 (0.32) | SMN1; SMN2 | |
| SCHEMBL15253582 | 0.75 | LTA4H (0.35) | LTA4HLMNASMN1; SMN2MAPTALDH1A1 | |
| SCHEMBL9101815 | 0.73 | HPGD (0.30) | — | |
| SCHEMBL1573251 | 0.71 | EPHX1 (0.36) | LTA4HLMNASMN1; SMN2ALDH1A1CYP3A4 | |
| SCHEMBL9101822 | 0.69 | HRH3 (0.30) | — | |
| SCHEMBL428858 | 0.69 | LTA4H (0.47) | LTA4HTSHRRECQLLMNASMN1; SMN2 | |
| SCHEMBL7765995 | 0.67 | SMN1; SMN2 (0.51) | LTA4HTSHRRECQLSMN1; SMN2ALDH1A1 | |
| SCHEMBL2400834 | 0.67 | LTA4H (0.47) | LTA4HLMNASMN1; SMN2MAPTALDH1A1 | |
| SCHEMBL28645986 | 0.66 | TDP1 (0.39) | TSHRSMN1; SMN2ALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105093832-B | Photosensitive composition, protective film and element having protective film | 奇美实业股份有限公司 | 2019-08-30 | — | — | CN | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| CN-104945908-B | Curable resin composition and use thereof | 奇美实业股份有限公司 | 2018-04-24 | — | — | CN | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| CN-106909028-A | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2017-06-30 | — | — | CN | disclosed |
| US-20170168390-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | CHI MEI CORPORATION (TW) | 2017-06-15 | — | — | US | disclosed |
| US-20170023860-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORP (TW) | 2017-01-26 | — | — | US | disclosed |
| US-9541832-B2 | Photosensitive resin composition, protective film and element having the same | CHI MEI CORPORATION (TW) | 2017-01-10 | — | — | US | disclosed |
| CN-106200270-A | Photosensitive resin composition for color filter and application thereof | 奇美实业股份有限公司 | 2016-12-07 | — | — | CN | disclosed |
| US-9507261-B2 | Photosensitive composition, protective film, and element having the protective film | CHI MEI CORPORATION (TW) | 2016-11-29 | — | — | US | disclosed |
| CN-103376661-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI COR | 2013-10-30 | — | — | CN | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130277627-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS OF THE SAME | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130260108-A1 | PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-10-03 | — | — | US | disclosed |
| US-8546061-B2 | Photo-curing polysiloxane composition and protective film formed from the same | CHI MEI CORPORATION (TW) | 2013-10-01 | — | — | US | disclosed |
| US-20130245150-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-09-19 | — | — | US | disclosed |
| US-20130228727-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2013-09-05 | — | — | US | disclosed |
| US-20130142966-A1 | BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-20130135763-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2013-05-30 | — | — | US | disclosed |
| US-20120141936-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-06-07 | — | — | US | disclosed |