SCHEMBL91173

SCHEMBL91173

C=C(C)C(=O)OC(=C)C1CCCO1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.39
KMT2A Q03164 3/20 0.37
MEN1 O00255 2/20 0.37
HPGD P15428 7/20 0.36
NOS2 P35228 1/20 0.36
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
TP53 P04637 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
POLB P06746 1/20 0.35
RECQL P46063 1/20 0.35
TSHR P16473 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
KDM4E B2RXH2 2/20 0.34
HSD17B10 Q99714 1/20 0.34
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL379290 0.86 HPGD (0.40) ALDH1A1KMT2AMEN1HPGDNOS2
SCHEMBL2338744 0.81 NOS2 (0.46) ALDH1A1KMT2AMEN1HPGDNOS2
SCHEMBL2558887 0.80 ALDH1A1 (0.48) ALDH1A1TSHRHSD17B10
SCHEMBL91174 0.76 NOS2 (0.36) ALDH1A1KMT2AMEN1HPGDNOS2
SCHEMBL29226547 0.74 ALDH1A1 (0.40) ALDH1A1KMT2AMEN1HPGDNPC1
SCHEMBL9710019 0.71 HPGD (0.44) ALDH1A1KMT2AMEN1HPGDNPC1
SCHEMBL76505 0.71 ALDH1A1 (0.41) ALDH1A1KMT2APOLB
SCHEMBL29121630 0.71 HPGD (0.49) ALDH1A1KMT2AMEN1HPGDNPC1
SCHEMBL5771317 0.71
SCHEMBL22332736 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-8129100-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-8003295-B2 Patterning process and resist composition used therein SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-23 US disclosed
US-20090253084-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-08 US disclosed