SCHEMBL914880

SCHEMBL914880

CCCCc1ccccc1CP(=O)(O)O

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 1/20 0.50
ACP3 P15309 1/20 0.49
TSHR P16473 2/20 0.47
LIPG Q9Y5X9 1/20 0.44
CETP P11597 1/20 0.42
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
PGK1 P00558 1/20 0.41
PGK2 P07205 1/20 0.41
CYSLTR2 Q9NS75 2/20 0.40
CYSLTR1 Q9Y271 2/20 0.40
GRIN2D O15399 1/20 0.39
GRIN3B O60391 1/20 0.39
GRIN1 Q05586 1/20 0.39
GRIN2A Q12879 1/20 0.39
GRIN2B Q13224 1/20 0.39
GRIN2C Q14957 1/20 0.39
GRIN3A Q8TCU5 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11232151 0.93 ENPP2 (0.60) ENPP2ACP3TSHRLIPGCETP
Phosphoric Acid SCHEMBL27503649 0.88 LIPG (0.50) ENPP2TSHRLIPGCETPCYP3A4
SCHEMBL916619 0.84 ACP3 (0.57) ENPP2ACP3TSHRPGK1PGK2
SCHEMBL11406544 0.84 ENPP2 (0.46) ENPP2ACP3TSHRLIPGPGK1
SCHEMBL31688366 0.83 TSHR (0.43) ENPP2TSHRLIPGCETPCYP3A4
SCHEMBL914603 0.83 CETP (0.44) TSHRLIPGCETP
SCHEMBL11499183 0.82 ACP3 (0.57) ENPP2ACP3TSHRPGK1PGK2
SCHEMBL8053801 0.82 ACP3 (0.65) ACP3TSHRPGK1PGK2GRIN2D
SCHEMBL11098805 0.80 LIPG (0.50) TSHRLIPGCETPCYP3A4CYP2D6
SCHEMBL27739238 0.80 ENPP2 (0.57) ENPP2PGK1PGK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
EP-2504387-A1 PHOTOVOLTAIC MODULE WITH UV-STABILIZED ENCAPSULANT BASF SE (DE) 2012-10-03 EP disclosed
EP-2475655-A1 STERICALLY HINDERED AMINE STABILIZER BASF SE (DE) 2012-07-18 EP disclosed
EP-2467424-A1 PHOTOVOLTAIC MODULE WITH STABILIZED POLYMERIC ENCAPSULANT BASF SE (DE) 2012-06-27 EP disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
WO-2011064192-A1 PHOTOVOLTAIC MODULE WITH UV-STABILIZED ENCAPSULANT BASF SE (DE) 2011-06-03 WO disclosed
WO-2011029744-A1 STERICALLY HINDERED AMINE STABILIZER BASF SE (DE) 2011-03-17 WO disclosed
WO-2011020760-A1 PHOTOVOLTAIC MODULE WITH STABILIZED POLYMERIC ENCAPSULANT BASF SE (DE) 2011-02-24 WO disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
WO-2003085039-A1 FLAME RETARDANT COATINGS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-10-16 WO disclosed
EP-1311635-A1 SOLVENT-BASED NON-FLUORESCENT INKS FOR WRITING INSTRUMENTS BASED UPON PIGMENT DISPERSIONS IN NON-AQUEOUS SOLVENTS BIC CORPORATION (US) 2003-05-21 EP disclosed
WO-2002016516-A1 SOLVENT-BASED NON-FLUORESCENT INKS FOR WRITING INSTRUMENTS BASED UPON PIGMENT DISPERSIONS IN NON-AQUEOUS SOLVENTS BIC CORPORATION (US) 2002-02-28 WO disclosed
EP-0027926-B1 DEGRADATION RESISTANT POLYOLEFIN ARTICLES AND PROCESS FOR MAKING SAME PHILLIPS PETROLEUM COMPANY (US) 1985-04-17 EP disclosed
US-RE31343-E STABILIZERS FOR POLYMERS CIBA-GEIGY CORPORATION (US) 1983-08-09 US disclosed
US-RE31342-E STABILIZERS FOR POLYMERS CIBA-GEIGY CORPORATION (US) 1983-08-09 US disclosed
EP-0012351-B1 PHOSPHONIC ACID ESTERS, THEIR PREPARATION, THEIR USE AS EMULSIFYING AND DISPERSING AGENTS, AND THEIR AQUEOUS COMPOSITIONS BAYER AG (DE) 1982-07-07 EP disclosed
US-4280960-A Phosphonic acid esters BAYER AKTIENGESELLSCHAFT (DE) 1981-07-28 US disclosed
EP-0012351-A1 Phosphonic acid esters, their preparation, their use as emulsifying and dispersing agents, and their aqueous compositions BAYER AG (DE) 1980-06-25 EP disclosed
US-4028334-A STABILIZERS FOR POLYMERS CIBA-GEIGY CORPORATION (US) 1977-06-07 US disclosed