SCHEMBL915231

SCHEMBL915231

CCCCc1ccc(-c2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.77

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 2/20 0.77
RARB P10826 6/20 0.57
S1PR2 O95136 6/20 0.54
S1PR1 P21453 6/20 0.54
S1PR3 Q99500 6/20 0.54
LPAR2 Q9HBW0 2/20 0.54
ALDH1A1 P00352 2/20 0.50
DGAT2 Q96PD7 1/20 0.50
MEN1 O00255 1/20 0.50
RARA P10276 1/20 0.50
MAPT P10636 1/20 0.50
MTOR P42345 1/20 0.50
KMT2A Q03164 1/20 0.50
S1PR4 O95977 4/20 0.49
FDFT1 P37268 1/20 0.49
PLK1 P53350 1/20 0.49
HPGD P15428 1/20 0.49
HSD17B10 Q99714 1/20 0.49
S1PR5 Q9H228 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915387 0.94 ENPP2 (0.86) ENPP2RARBS1PR2S1PR1S1PR3
SCHEMBL917399 0.89 ENPP2 (0.77) ENPP2RARBS1PR2S1PR1S1PR3
SCHEMBL11028970 0.87 ENPP2 (1.00) ENPP2S1PR2S1PR1S1PR3LPAR2
SCHEMBL11422296 0.87 ENPP2 (1.00) ENPP2S1PR2S1PR1S1PR3LPAR2
SCHEMBL27874765 0.87 ENPP2 (1.00) ENPP2S1PR2S1PR1S1PR3LPAR2
Ammonia Solution, Strong SCHEMBL11295968 0.86 ENPP2 (0.96) ENPP2S1PR2S1PR1S1PR3LPAR2
SCHEMBL916540 0.85 ENPP2 (0.71) ENPP2RARBS1PR2S1PR1S1PR3
SCHEMBL914763 0.85 ENPP2 (0.71) ENPP2S1PR2S1PR1S1PR3LPAR2
SCHEMBL915609 0.85 ENPP2 (0.71) ENPP2RARBS1PR2S1PR1S1PR3
SCHEMBL914858 0.83 ENPP2 (0.69) ENPP2S1PR2S1PR1S1PR3LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 CN disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed