SCHEMBL917399

SCHEMBL917399

CCCCc1ccc(Cc2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.77

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 3/20 0.77
PLK1 P53350 1/20 0.53
S1PR1 P21453 11/20 0.53
S1PR3 Q99500 10/20 0.53
S1PR2 O95136 9/20 0.53
S1PR4 O95977 6/20 0.53
LPAR2 Q9HBW0 3/20 0.50
DGAT2 Q96PD7 1/20 0.50
S1PR5 Q9H228 1/20 0.50
ALDH1A1 P00352 1/20 0.49
HPGD P15428 1/20 0.49
HSD17B10 Q99714 1/20 0.49
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
RARB P10826 1/20 0.45
PGK1 P00558 1/20 0.44
PGK2 P07205 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915387 0.94 ENPP2 (0.86) ENPP2PLK1S1PR1S1PR3S1PR2
SCHEMBL915231 0.89 ENPP2 (0.77) ENPP2PLK1S1PR1S1PR3S1PR2
SCHEMBL11422296 0.87 ENPP2 (1.00) ENPP2S1PR1S1PR3S1PR2S1PR4
SCHEMBL27874765 0.87 ENPP2 (1.00) ENPP2S1PR1S1PR3S1PR2S1PR4
SCHEMBL11028970 0.87 ENPP2 (1.00) ENPP2S1PR1S1PR3S1PR2S1PR4
Ammonia Solution, Strong SCHEMBL11295968 0.86 ENPP2 (0.96) ENPP2S1PR1S1PR3S1PR2S1PR4
SCHEMBL916540 0.85 ENPP2 (0.71) ENPP2PLK1S1PR1S1PR3S1PR2
SCHEMBL914763 0.85 ENPP2 (0.71) ENPP2PLK1S1PR1S1PR3S1PR2
SCHEMBL915609 0.85 ENPP2 (0.71) ENPP2PLK1S1PR1S1PR3S1PR2
SCHEMBL914858 0.83 ENPP2 (0.69) ENPP2PLK1S1PR1S1PR3S1PR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 CN disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed