SCHEMBL915347

SCHEMBL915347

CCOP(=O)(Cc1ccc(-c2ccc(OCCO)cc2)cc1)OCC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 1/20 0.44
S1PR1 P21453 1/20 0.44
ALDH1A1 P00352 2/20 0.40
CYP3A4 P08684 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
MEN1 O00255 1/20 0.40
USP2 O75604 1/20 0.40
LMNA P02545 1/20 0.40
MAPK1 P28482 1/20 0.40
CASP1 P29466 1/20 0.40
KMT2A Q03164 1/20 0.40
SLCO1B3 Q9NPD5 1/20 0.40
SLCO1B1 Q9Y6L6 1/20 0.40
RECQL P46063 1/20 0.40
PPARD Q03181 1/20 0.40
HDAC1 Q13547 1/20 0.39
GAA P10253 1/20 0.39
RARB P10826 3/20 0.38
CCNT1 O60563 1/20 0.38
CDK9 P50750 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL917394 0.97 NR1I2 (0.46) NR1I2S1PR1ALDH1A1CYP3A4SMN1; SMN2
SCHEMBL915282 0.88 S1PR1 (0.46) NR1I2S1PR1ALDH1A1CYP3A4SMN1; SMN2
SCHEMBL914820 0.88 KDM4E (0.39) S1PR1CYP3A4RECQLPPARDHDAC1
SCHEMBL914815 0.85 NR1I2 (0.46) NR1I2S1PR1ALDH1A1CYP3A4SMN1; SMN2
SCHEMBL2493713 0.84 TSHR (0.44) PPARDHDAC1CCNT1CDK9
SCHEMBL915260 0.83 KDM4E (0.42) ALDH1A1SMN1; SMN2LMNARECQLCCNT1
SCHEMBL10866160 0.82 NQO1 (0.52) ALDH1A1SMN1; SMN2LMNAMAPK1CCNT1
SCHEMBL916805 0.82 PPARD (0.42) NR1I2ALDH1A1RECQLPPARDHDAC1
SCHEMBL915696 0.81 PTPN1 (0.43) NR1I2S1PR1ALDH1A1CYP3A4SMN1; SMN2
SCHEMBL916357 0.81 NR1I2 (0.43) NR1I2S1PR1ALDH1A1CYP3A4SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed