SCHEMBL915282

SCHEMBL915282

CCOP(=O)(O)Cc1ccc(-c2ccc(OCCO)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR1 P21453 3/20 0.46
NR1I2 O75469 1/20 0.44
PPARD Q03181 1/20 0.42
ALDH1A1 P00352 2/20 0.40
CYP3A4 P08684 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
MEN1 O00255 1/20 0.40
USP2 O75604 1/20 0.40
LMNA P02545 1/20 0.40
MAPK1 P28482 1/20 0.40
CASP1 P29466 1/20 0.40
KMT2A Q03164 1/20 0.40
SLCO1B3 Q9NPD5 1/20 0.40
SLCO1B1 Q9Y6L6 1/20 0.40
RECQL P46063 1/20 0.40
HDAC1 Q13547 1/20 0.39
GAA P10253 1/20 0.39
RARB P10826 3/20 0.38
MMP2 P08253 1/20 0.38
MMP9 P14780 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914815 0.97 NR1I2 (0.46) S1PR1NR1I2PPARDALDH1A1CYP3A4
SCHEMBL915696 0.93 PTPN1 (0.43) S1PR1NR1I2PPARDALDH1A1CYP3A4
SCHEMBL916357 0.93 NR1I2 (0.43) S1PR1NR1I2PPARDALDH1A1CYP3A4
SCHEMBL914836 0.90 S1PR1 (0.43) S1PR1PPARDRECQLHDAC1RARB
SCHEMBL914605 0.89 NR1I2 (0.40) S1PR1NR1I2PPARDALDH1A1CYP3A4
SCHEMBL914845 0.89 GAA (0.55) S1PR1NR1I2PPARDALDH1A1SMN1; SMN2
SCHEMBL915347 0.88 NR1I2 (0.44) S1PR1NR1I2PPARDALDH1A1CYP3A4
SCHEMBL915509 0.88 SMN1; SMN2 (0.46) S1PR1NR1I2ALDH1A1CYP3A4SMN1; SMN2
SCHEMBL915529 0.88 GAA (0.44) S1PR1NR1I2PPARDALDH1A1CYP3A4
SCHEMBL916688 0.85 ACACB (0.41) S1PR1ALDH1A1SMN1; SMN2LMNARECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed