SCHEMBL9162906

SCHEMBL9162906

CC(=O)OC(C)(C)CCCOS(=O)(=O)c1ccc(C)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSMD10 O75832 1/20 0.40
STAT3 P40763 2/20 0.40
ALDH1A1 P00352 4/20 0.38
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA9 Q16790 1/20 0.36
CTDSP1 Q9GZU7 1/20 0.36
SIRT5 Q9NXA8 1/20 0.36
CYP24A1 Q07973 1/20 0.35
PPARA Q07869 2/20 0.35
CYP2C9 P11712 3/20 0.35
LMNA P02545 3/20 0.35
CYP3A4 P08684 2/20 0.35
CYP2C19 P33261 2/20 0.35
GAA P10253 1/20 0.35
MAPK1 P28482 1/20 0.35
ALB P02768 1/20 0.35
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12969785 0.92 STAT3 (0.41) PSMD10STAT3ALDH1A1KMT2AMEN1
SCHEMBL29438577 0.84 STAT3 (0.44) STAT3ALDH1A1KMT2AMEN1CTDSP1
SCHEMBL7849777 0.82 ALDH1A1 (0.46) PSMD10ALDH1A1KMT2AMEN1GAA
SCHEMBL16382424 0.81 ALDH1A1 (0.46) PSMD10STAT3ALDH1A1KMT2AMEN1
SCHEMBL19069752 0.81 ALDH1A1 (0.42) PSMD10STAT3ALDH1A1KMT2AMEN1
SCHEMBL7849776 0.81 KMT2A (0.40) PSMD10STAT3ALDH1A1KMT2AMEN1
SCHEMBL15270828 0.79 CA12 (0.40) PSMD10STAT3ALDH1A1KMT2AMEN1
SCHEMBL6686683 0.79 PSMD10 (0.44) PSMD10STAT3ALDH1A1KMT2ACA12
SCHEMBL13740848 0.79 PSMD10 (0.44) PSMD10STAT3ALDH1A1KMT2ACA12
SCHEMBL15665928 0.78 STAT3 (0.46) PSMD10STAT3ALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9285679-B2 Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition FUJIFILM CORPORATION (JP) 2016-03-15 US disclosed
US-20150010855-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2015-01-08 US disclosed
US-20150010855-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2015-01-08 US disclosed
US-5410054-A Heteroaryl quinolines as inhibitors of leukotriene biosynthesis MERCK FROSST CANADA, INC. (CA) 1995-04-25 US disclosed