Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 6/20 | 0.43 |
| ▸ | MEN1 | O00255 | 5/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.39 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.39 |
| ▸ | ACACB | O00763 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 6/20 | 0.36 |
| ▸ | HTT | P42858 | 3/20 | 0.36 |
| ▸ | UBE2N | P61088 | 2/20 | 0.36 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | MITF | O75030 | 1/20 | 0.36 |
| ▸ | KLK7 | P49862 | 8/20 | 0.35 |
| ▸ | RAD52 | P43351 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | STAT3 | P40763 | 1/20 | 0.33 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14462468 | 0.89 | APOBEC3A (0.41) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL9616815 | 0.88 | APOBEC3A (0.40) | NPSR1ALDH1A1APOBEC3AAPOBEC3GMAPT | |
| SCHEMBL9868418 | 0.88 | NPSR1 (0.48) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL6671753 | 0.87 | NPSR1 (0.42) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL11772726 | 0.87 | SMN1; SMN2 (0.45) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL7767160 | 0.87 | NPSR1 (0.45) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL14564633 | 0.86 | KMT2A (0.46) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL9848197 | 0.86 | SMN1; SMN2 (0.44) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL7040054 | 0.85 | NPSR1 (0.46) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 | |
| SCHEMBL9400534 | 0.83 | MEN1 (0.41) | NPSR1MEN1MAPK1KMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7244550-B2 | Silver halide color photographic photosensitive material | FUJIFILM CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| US-7244550-B2 | Silver halide color photographic photosensitive material | FUJIFILM CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| EP-0308750-B1 | Base precursor and light-sensitive material containing base precursor | FUJI PHOTO FILM CO LTD (JP) | 1995-12-13 | — | — | EP | disclosed |
| EP-0404192-B1 | Light-sensitive material containing silver halide, reducing agent, polymerizable compound and base precursor | FUJI PHOTO FILM CO LTD (JP) | 1995-08-23 | — | — | EP | disclosed |
| EP-0383358-B1 | Light-sensitive material containing silver halide reducing agent and polymerizable compound | FUJI PHOTO FILM CO LTD (JP) | 1995-04-26 | — | — | EP | disclosed |
| EP-0251203-B1 | Image-forming method using light-sensitive material and image-receiving material | FUJI PHOTO FILM CO LTD (JP) | 1993-11-24 | — | — | EP | disclosed |
| EP-0237059-B1 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO LTD (JP) | 1993-10-27 | — | — | EP | disclosed |
| EP-0301539-B1 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO LTD (JP) | 1993-10-27 | — | — | EP | disclosed |
| EP-0237025-B1 | Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same | FUJI PHOTO FILM CO LTD (JP) | 1993-10-20 | — | — | EP | disclosed |
| EP-0234580-B1 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO LTD (JP) | 1993-10-20 | — | — | EP | disclosed |
| EP-0237058-A2 | Light sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO., LTD. (JP) | 1987-09-16 | — | — | EP | disclosed |
| EP-0237059-A2 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO., LTD. (JP) | 1987-09-16 | — | — | EP | disclosed |
| EP-0237024-A2 | Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1987-09-16 | — | — | EP | disclosed |
| EP-0237054-A2 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO., LTD. (JP) | 1987-09-16 | — | — | EP | disclosed |
| EP-0235751-A2 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | Fuji Photo Film Co., Ltd. (JP) | 1987-09-09 | — | — | EP | disclosed |
| EP-0234580-A2 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO., LTD. (JP) | 1987-09-02 | — | — | EP | disclosed |
| EP-0232721-A2 | Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound | FUJI PHOTO FILM CO., LTD. (JP) | 1987-08-19 | — | — | EP | disclosed |
| EP-0228083-A2 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound, and image-forming method employing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1987-07-08 | — | — | EP | disclosed |
| EP-0228085-A2 | Light-sensitive material containing silver halide, reducing agent and polymerizable compound, and image-forming method employing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1987-07-08 | — | — | EP | disclosed |
| EP-0224214-A2 | Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1987-06-03 | — | — | EP | disclosed |