SCHEMBL916700

SCHEMBL916700

COC(=O)c1ccc(C(=O)OC)c(CP(=O)(O)O)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 15/20 0.53
ALDH1A1 P00352 13/20 0.53
HPGD P15428 6/20 0.53
MAPT P10636 5/20 0.53
HSD17B10 Q99714 5/20 0.53
GLA P06280 3/20 0.53
GAA P10253 3/20 0.53
ATM Q13315 3/20 0.53
CASP1 P29466 1/20 0.53
CASP7 P55210 1/20 0.53
SMN1; SMN2 Q16637 1/20 0.47
KMT2A Q03164 1/20 0.46
LMNA P02545 3/20 0.45
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
XDH P47989 1/20 0.45
CA9 Q16790 1/20 0.45
CA14 Q9ULX7 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914623 0.85 KDM4E (0.50) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL914651 0.82 KDM4E (0.50) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL2707157 0.82 KDM4E (0.48) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL12796984 0.82 KDM4E (0.62) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL8482173 0.80 KDM4E (0.59) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL8482179 0.80 KDM4E (0.59) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL914653 0.80 KDM4E (0.48) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL9390886 0.80 DPP4 (0.46) KDM4EALDH1A1HPGDMAPTHSD17B10
SCHEMBL8113848 0.80 MAPT (0.53) KDM4EALDH1A1MAPTHSD17B10ATM
SCHEMBL11601201 0.79 KDM4E (0.57) KDM4EALDH1A1HPGDMAPTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed