SCHEMBL914653

SCHEMBL914653

CCC(C)OP(=O)(O)Cc1cc(C(=O)OC)ccc1C(=O)OC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 15/20 0.48
ALDH1A1 P00352 12/20 0.48
LMNA P02545 2/20 0.48
KMT2A Q03164 2/20 0.46
HPGD P15428 6/20 0.45
MAPT P10636 5/20 0.45
HSD17B10 Q99714 6/20 0.43
GLA P06280 3/20 0.43
GAA P10253 2/20 0.43
CASP1 P29466 1/20 0.43
CASP7 P55210 1/20 0.43
ATM Q13315 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
POLB P06746 2/20 0.37
APOBEC3A P31941 1/20 0.37
APOBEC3G Q9HC16 1/20 0.37
TSHR P16473 1/20 0.37
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL913959 0.84 ACE2 (0.39) KDM4EALDH1A1LMNAMAPTTSHR
SCHEMBL914624 0.84 ALDH1A1 (0.46) KDM4EALDH1A1LMNAKMT2AHSD17B10
SCHEMBL914623 0.83 KDM4E (0.50) KDM4EALDH1A1LMNAKMT2AHPGD
SCHEMBL915305 0.81 LOXL2 (0.46) KDM4EALDH1A1KMT2AHPGDMAPT
SCHEMBL916700 0.80 KDM4E (0.53) KDM4EALDH1A1LMNAKMT2AHPGD
SCHEMBL915374 0.79 LOXL2 (0.51) KDM4EALDH1A1HPGDMAPTSMN1; SMN2
SCHEMBL915656 0.78 HSD17B10 (0.46) KDM4EALDH1A1LMNAKMT2AHPGD
SCHEMBL915113 0.78 LOXL2 (0.43) KMT2AMAPTL3MBTL1SMN1; SMN2CA12
SCHEMBL914651 0.76 KDM4E (0.50) KDM4EALDH1A1LMNAKMT2AHPGD
SCHEMBL12796984 0.75 KDM4E (0.62) KDM4EALDH1A1LMNAKMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed