SCHEMBL916764

SCHEMBL916764

COCCOc1ccc(OCCOC)c(CP(=O)(O)O)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
INPPL1 O15357 2/20 0.50
PGK1 P00558 1/20 0.39
PGK2 P07205 1/20 0.39
MAPT P10636 3/20 0.37
HPGD P15428 2/20 0.37
MTNR1A P48039 1/20 0.37
MTNR1B P49286 1/20 0.37
ATM Q13315 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PTGES O14684 1/20 0.37
ALOX5 P09917 1/20 0.37
PPARG P37231 1/20 0.37
FDPS P14324 2/20 0.37
HDAC1 Q13547 1/20 0.37
MMP2 P08253 2/20 0.36
MMP9 P14780 2/20 0.36
MMP12 P39900 2/20 0.36
F2 P00734 1/20 0.36
ELANE P08246 1/20 0.36
KDM4E B2RXH2 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915314 0.86 INPPL1 (0.47) INPPL1PGK1PGK2PTGESALOX5
SCHEMBL916024 0.86 INPPL1 (0.46) INPPL1MAPTHPGDMTNR1AMTNR1B
SCHEMBL916366 0.81 INPPL1 (0.40) INPPL1MAPTHPGDMTNR1AMTNR1B
SCHEMBL916368 0.81 INPPL1 (0.41) INPPL1MAPTHPGDMTNR1AMTNR1B
SCHEMBL27727424 0.80 L3MBTL1 (0.49) MAPTHPGDATML3MBTL1MMP2
SCHEMBL915764 0.76 ENPP2 (0.45) INPPL1PGK1PGK2MAPT
SCHEMBL915771 0.75 ACP3 (0.47) PPARGKDM4EHTTKMT2A
SCHEMBL915784 0.74 INPPL1 (0.42) INPPL1MAPTHPGDMTNR1AMTNR1B
SCHEMBL31688377 0.74 GGPS1 (0.49) PGK1PGK2L3MBTL1KDM4E
SCHEMBL915132 0.74 GGPS1 (0.49) PGK1PGK2L3MBTL1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed