SCHEMBL9176306

SCHEMBL9176306

O=C(O)CCC(Br)(Br)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11249687 0.97 NAALAD2 (0.48)
SCHEMBL25228290 0.82 LMNA (0.53)
SCHEMBL25225114 0.80 LMNA (0.58)
SCHEMBL14097224 0.78 TSHR (0.60)
SCHEMBL8316251 0.77 ALDH1A1 (0.43)
SCHEMBL11617175 0.77
SCHEMBL12616580 0.77 LMNA (0.42)
SCHEMBL7023611 0.77
SCHEMBL7827164 0.77
SCHEMBL14963643 0.73 LMNA (0.53)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0652887-A1 NEW DERIVATIVES OF NEURAMINIC ACID FIDIA S.p.A. (IT) 1995-05-17 EP claimed
WO-1994003469-A1 NEW DERIVATIVES OF NEURAMINIC ACID FIDIA S.P.A. (IT) 1994-02-17 WO claimed
US-12577373-B2 Carbodiimide composition, curing agent composition, coating composition and resin cured product ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-03-17 US disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
US-20230135772-A1 CARBODIIMIDE COMPOSITION, CURING AGENT COMPOSITION, COATING COMPOSITION AND RESIN CURED PRODUCT ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-05-04 US disclosed
EP-4130154-A1 CARBODIIMIDE COMPOSITION, HARDENER COMPOSITION, COATING COMPOSITION, AND CURED RESIN OBJECT Asahi Kasei Kabushiki Kaisha (JP) 2023-02-08 EP disclosed
CN-113387806-B Branched compound, preparation method thereof and application thereof in preparing branched alicyclic resin 新丰博兴聚合材料有限公司 2022-12-27 CN disclosed
CN-113387806-A Branched compound, preparation method thereof and application thereof in preparing branched alicyclic resin 新丰博兴聚合材料有限公司 2021-09-14 CN disclosed
US-4335057-A 4-(2',2,2'-Trihalogenoethyl)-cyclobutane-1-sulfonic acid salts with optically active bases CIBA-GEIGY CORPORATION (US) 1982-06-15 US disclosed
US-4322374-A 2,4,4,4-Tetrahalobutanoic acid halide CIBA-GEIGY CORPORATION (US) 1982-03-30 US disclosed
US-4299967-A Process for producing optically active 2-(2,2-dihalogenovinyl)-cyclopropane-1-carboxylic acids substituted in the 3-position, and derivatives thereof, as well as novel 4-(2,2,2-trihalogenoethyl)-cyclobutane-1-sulfonic acid salts CIBA-GEIGY CORPORATION (US) 1981-11-10 US disclosed
US-4242278-A Process for the preparation of 2-(2',2',2'-trihalogenoethyl)-4-halogenocyclobutan-1-ones CIBA-GEIGY CORPORATION (US) 1980-12-30 US disclosed
US-4009203-A REACTION PRODUCT OF TIN HALIDE WITH A CARBOXYLIC ACID AS CATALYST UNIVERSAL OIL PRODUCTS COMPANY (US) 1977-02-22 US disclosed