SCHEMBL9178124

SCHEMBL9178124

COC(OC)c1cccc(OC(=O)OC(C)(C)C)c1

nearest known ligand 0.46

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.46
ACHE P22303 4/20 0.40
CA2 P00918 1/20 0.38
CYP3A4 P08684 1/20 0.38
BCHE P06276 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
ATM Q13315 1/20 0.38
FAAH O00519 1/20 0.37
PTGS1 P23219 1/20 0.37
MTNR1A P48039 1/20 0.36
MTNR1B P49286 1/20 0.36
KDM1A O60341 1/20 0.36
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16959956 0.82 ELANE (0.46) ELANEACHECA2CYP3A4BCHE
SCHEMBL8581995 0.82 ELANE (0.49) ELANEACHECYP3A4BCHEL3MBTL1
SCHEMBL8781783 0.81 ELANE (0.60) ELANECA2CYP3A4L3MBTL1ATM
SCHEMBL10148455 0.80 HDAC4 (0.46) ELANEACHECA2BCHEFAAH
SCHEMBL9174578 0.79 BCHE (0.39) ELANEACHEBCHEL3MBTL1ATM
SCHEMBL16952675 0.78 ELANE (0.51) ELANEACHECA2CYP3A4BCHE
SCHEMBL6392035 0.78 CYP3A4 (0.62) ELANECA2CYP3A4KDM1AESR1
SCHEMBL2738445 0.76 LMNA (0.61) ELANEACHECYP3A4BCHEFAAH
SCHEMBL12315891 0.76 ELANE (0.53) ELANEACHECA2CYP3A4KDM1A
SCHEMBL1792489 0.75 ELANE (0.51) ELANEACHECA2CYP3A4ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0525626-B1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AG (DE) 1995-06-14 EP disclosed
US-5356752-A Compounds with acid-labile protective groups useful in positive-working radiation-sensitive mixtures HOECHST AKTIENGESELLSCHAFT (DE) 1994-10-18 US disclosed
EP-0525626-A1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-03 EP disclosed